A fast iterative line-circle optimal fitting method

An iterative optimization and iterative technology, applied in the field of online circle fitting, can solve the problems of long time consumption, reduced search space, and low precision, and achieve the effect of shortening fitting time, reducing search space, and improving fitting efficiency

Pending Publication Date: 2018-12-18
BEIJING LUSTER LIGHTTECH
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Problems solved by technology

[0004] This application provides a fast iterative optimal fitting method for line and circle, which has solved the problems of time-consuming, poor stability, and low precision of other fitting techniques in the prior art, and the optimal fitting method for line and circle provided by this ap

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  • A fast iterative line-circle optimal fitting method
  • A fast iterative line-circle optimal fitting method
  • A fast iterative line-circle optimal fitting method

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[0037] see figure 1 , is a flow chart of a fast iterative line-circle optimal fitting method of the present application;

[0038] Depend on figure 1 It can be seen that the embodiment of the present application provides a fast iterative line-circle optimal fitting method, and the method mainly includes:

[0039] Step S10: Construct candidate fitting results according to all data points;

[0040] Step S20: iteratively optimizing the candidate fitting results;

[0041] Step S30: Screen out the optimal curve.

[0042] In the embodiment of the present application, step S10: constructing candidate fitting results based on all data points is to obtain candidate fitting results through full traversal in a basic search space, that is, a limited set of data points, and the candidate fitting results , refers to the set of fitting curve results that may contain the optimal curve or the RMS error (root-mean-square error) near the optimal curve is small. Therefore, the process of cons...

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Abstract

The present application discloses a fast iterative line-circle optimal fitting method, which comprises: constructing candidate fitting results according to all data points; iteratively optimizing thecandidate fitting results; selecting an optimal curve. The candidate fitting results are obtained by full traversal in a basic search space to obtain a set of curves containing the optimal curve or the curves near the optimal curve and with the smallest error; the iterative optimization utilizes the prior knowledge that the outlier removed from the optimal fitting result must be the farthest datapoint to the curve, and iteratively modifies the outlier in the candidate fitting result, so that the candidate fitting result becomes stable and the RMS error is further reduced. Screening the optimal curve is to compare the RMS error of the iteratively optimized fitting curves and screen is the curves with the smallest error as the best fitting results. The line-circle optimal fitting method provided by the present application greatly shortens the fitting time, and the fitting process is non-random, so that the global optimal fitting result can be obtained quickly, stably and accurately.

Description

technical field [0001] The embodiments of the present application relate to the technical field of positioning, measurement and detection in industrial applications, and in particular to a line-circle fitting method for positioning, measurement and detection. Background technique [0002] Lines and circles are the most frequently used target or edge features in applications. In industrial applications, line and circle features are often used for positioning to assist in the completion of measurement and detection, such as: line positioning, circle positioning or corner positioning, etc.; or for defect detection, such as: edge detection, edge width detection etc.; or, it is used to measure and calculate distance, angle and intersection, such as: quality inspection of target length and width, etc. The line and circle feature needs to be obtained by fitting the image data points, that is, the line and circle fitting technology. [0003] At present, there are four commonly use...

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Application Information

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IPC IPC(8): G06T11/20
CPCG06T11/203
Inventor 柯俊山姚毅
Owner BEIJING LUSTER LIGHTTECH
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