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95results about How to "High degree of accuracy" patented technology

Method and apparatus for measuring thickness of thin film and device manufacturing method using same

The present invention provides a manufacturing method and manufacturing device for high-precision thin film devices, whereby the film thickness and film thickness distribution of a transparent film is measured to a high degree of accuracy during processing, and the film thickness can be controlled with high precision during CMP processing, by accurately measuring the film thickness of the uppermost layer, without being affected by the film thickness distribution between LSI regions or within the semiconductor wafer surface generated by CMP processing. The field of view and measurement position used for measuring the film thickness of a transparent film during processing are set such that the measured area is not affected by the film thickness distribution of the actual device patterns subjected to CMP processing. Moreover, the film thickness is measured by specifying relatively level measurement regions, according to a characteristic quantity of the spectral waveform of the reflected light from the transparent film, such as the reflection intensity, frequency spectrum intensity, or the like, thereby permitting highly accurate control of film thickness. Consequently, the leveling process in CMP processing can be optimized on the basis of the film thickness distribution, the film deposition conditions in the film deposition stage and the etching conditions in the etching stage can also be optimized, and hence a high-precision semiconductor device can be manufactured.
Owner:HITACHI LTD

Storage apparatus provided with a plurality of nonvolatile semiconductor storage media and storage control method

A storage apparatus is provided with a plurality of nonvolatile semiconductor storage media and a storage controller that is a controller that is coupled to the plurality of semiconductor storage media. The storage controller identifies a first semiconductor storage unit that is at least one semiconductor storage media and a second semiconductor storage unit that is at least one semiconductor storage media and that is provided with a remaining length of life shorter than that of the first semiconductor storage unit based on the remaining life length information that has been acquired. The storage controller moreover identifies a first logical storage region for the first semiconductor storage unit and a second logical storage region that is provided with a write load higher than that of the first logical storage region for the second semiconductor storage unit based on the statistics information that indicates the statistics that is related to a write for every logical storage region. The storage controller reads data from the first logical storage region and the second logical storage region, and writes data that has been read from the first logical storage region to the second logical storage region and/or writes data that has been read from the second logical storage region to the first logical storage region.
Owner:HITACHI LTD
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