Method of plating non-uniform multi-layer thin film

Abstract

The invention relates to the technical field of film-plating equipment, and particularly relates to a method of plating a non-uniform multi-layer thin film. The method includes: S1) cleaning a test piece (3) with acetone; S2) drying the test piece (3); S3) placing the test piece (3) on a test piece table (3); S4) plating a first thin film layer (301), wherein the aperture of a diaphragm (5) is driven to be increased from zero at the rate of V1 by means of a project control system; S5) plating a second thin film layer (302), wherein a shield device (6) is driven to be increased from minimum radius status at the rate of V2 by means of the project control system; S6) plating a third thin film layer (303), wherein the aperture of the diaphragm (5) is driven to be increased from zero at the rate of V3 by means of the project control system; S7) completing the film plating operation and turning the film-plating equipment of the non-uniform multi-layer thin film off. By means of the method, the non-uniform multi-layer thin film can be formed, which lays the foundation of researching on the non-uniform multi-layer thin film.

Description

technical field [0001] The invention relates to the technical field of coating, in particular to a method for coating a non-uniform multi-layer film. Background technique [0002] The application of magnetron sputtering technology is becoming more and more extensive, and it plays a huge role in the fields of industrial production and scientific research. [0003] The magnetron sputtering coating system is developed from the basic two-pole sputtering system to solve the problems that the two-pole sputtering coating speed is much slower than evaporation, the plasma ionization rate is low, and the thermal effect of the substrate is obvious. The magnetron sputtering system places a 100-1000 Gauss powerful magnet behind the cathode target, and the vacuum chamber is filled with an inert gas (Ar) at a pressure of 0.1-10 Pa as a carrier for gas discharge. Under the action of high pressure, Ar atoms ionize into Ar + Ions and electrons generate a plasma glow discharge. During the pr...

AI Technical Summary

Problems solved by technology

[0005] Using the coating method in the prior art, it is impossible to plate a multilayer film with uneven thickness from the middle of the sample to the edge of the sample in the cross-sectional direction, that is, the thickness of the film layer from the middle of the sample surface to the sample surface At the edge, the thickness of the film layer gradually becomes smaller or larger, thus limiting the research work of researchers on multilayer films with non-uniform thickness from the middle of the sample to the edge of the sample in the cross-sectional direction

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