Substrate holder

A substrate table and substrate technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of affecting production progress, increasing equipment cost, increasing production cost, etc., to improve temperature control accuracy , the effect of simplifying the structure

Active Publication Date: 2019-01-22
48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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  • Abstract
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Problems solved by technology

However, the latter two motion structures are obviously more complicated, and the volume becomes larger, resulting in a larger volume of the coating chamber and a considerable increase in equipment costs.
[0006] In addition, the loading capacity of the substrate table is limited. After the process is comp

Method used

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Embodiment Construction

[0026] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0027] Such as figure 1 and figure 2 As shown, the substrate stage of this embodiment includes a substrate tray 1 and a temperature sensor 2 for measuring the temperature of the substrate 70. The substrate stage also includes a fluid input pipe 3, a fluid output pipe 4, and a temperature control device 5. The disc 1 is provided with a heat conduction chamber 11, one end of the fluid input pipe 3 is connected to the output port of the temperature control device 5, and the other end is communicated with the heat conduction chamber 11, and one end of the fluid output pipe 4 is communicated with the heat conduction chamber 11, and the other end is connected with the temperature control device 5's return port connection. Among them, the fluid is preferably a liquid, and the characteristics of the liquid need to meet the process requirem...

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Abstract

The invention discloses a substrate holder. The substrate holder comprises a substrate carrying disc and a temperature sensor for measuring the temperature of a substrate. The substrate holder furthercomprises a fluid input tube, a fluid output tube and a temperature control device. The substrate carrying disc is provided with a heat conducting chamber. One end of the fluid input tube is connected with the output port of the temperature control device, and the other end of the fluid input tube is in communication with the heat conducting chamber. One end of the fluid output tube is in communication with the heat conducting chamber, and the other end of the fluid output tube is connected with the return port of the temperature control device. The substrate holder of the invention has the advantages of simplified structure, high temperature control precision, continuous adjustability of temperature, etc.

Description

technical field [0001] The invention relates to vacuum coating equipment, in particular to a substrate table. Background technique [0002] In the field of vacuum coating equipment, the uniformity and adhesion of the film on the surface of the substrate are the key indicators to measure the quality of the film and the performance of the coating equipment. The quality of the film is determined by many factors. For example, for the magnetron sputtering coating equipment, the distribution uniformity of the electromagnetic field, the rationality of the gas distribution, the distance between the target and the substrate, the movement mode of the substrate, and the uniformity of heating of the substrate will all affect the formation. film quality. As far as the substrate is concerned, it mainly includes two aspects: the movement mode of the substrate and the temperature control of the substrate. [0003] During the growth process of the film, the temperature of the substrate is ...

Claims

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Application Information

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IPC IPC(8): C23C14/50C23C14/54
CPCC23C14/505C23C14/541
Inventor 胡振东陈特超胡凡龚杰洪程文进李克罗超
Owner 48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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