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A dual-beam system sample stage for loading near-local electrodes

A sample stage and electrode technology, applied in circuits, discharge tubes, electrical components, etc., can solve the problems of weak, high capital cost, short service life of near-local electrodes, etc., to improve equipment efficiency, work stably and reliably, and prevent movement. Effect

Active Publication Date: 2020-10-30
NANJING UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The traditional treatment method for contaminated near-local electrodes is often to put the used near-local electrodes into the first-level vacuum chamber of the three-dimensional atom probe equipment for plasma cleaning, and clean them at 150°C for 8-12 hours. This is more useful for near-local electrodes that are not seriously polluted, but for heavily polluted near-local electrodes with large-scale pollutants on the surface, the cleaning effect is very weak, and they can only be scrapped and returned to the factory for reprocessing. Therefore, the traditional The cleaning method has great limitations: the service life of the near-local electrode is short, the capital cost is high, and the long cycle of purchasing the electrode affects the normal use of the equipment

Method used

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  • A dual-beam system sample stage for loading near-local electrodes
  • A dual-beam system sample stage for loading near-local electrodes

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Embodiment Construction

[0021] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0022] Such as figure 1 , 2 As shown, a focused ion beam / scanning electron microscope dual-beam system sample stage for loading near-local electrodes, the sample stage includes: sample stage main body 1, dovetail-shaped sample slot 2, square card slot 4, inner hexagonal fastening The screw 5 and the fixing rod 3 are vertical to the bottom of the main body 1 of the sample stage. The main body 1 of the sample table is provided with a dovetail-shaped sample slot 2; the dovetail-shaped sample slot 2 is used to load the near-local electrode; The electrode; the hexagon socket set screw 5 withstands the pin at the bottom of the near-local electrode through the square slot 4 to further fix the near-local electrode; the fixed rod 3 is used to connect the rotating base of the focused ion beam / scanning electron microscope dual-beam system.

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Abstract

The invention relates to a focused ion beam and scanning electron microscope double-beam system sample table for loading a near-local electrode. The sample table comprises a sample table main body, aswallow-tailed sample slot, a square card slot, an internal hexagonal tapping screw and a fixed rod, wherein the fixed rod is vertical to the bottom of the sample table main body; the sample table main body is internally provided with the swallow-tailed sample slot; the swallow-tailed sample slot is used for loading the near-local electrode; the bottom of the swallow-tailed sample slot is providedwith the square card slot; the square card slot is used for clamping a pin bolt at the bottom of the near-local electrode; the internal hexagonal tapping screw resists against the pin bolt at the bottom of the near-local electrode through the square card slot so as to further fix the near-local electrode; and the fixed rod is used for connecting a focused ion beam and scanning electron microscopedouble-beam system rotation base. In the use process of the focused ion beam and scanning electron microscope double-beam system sample table for loading the near-local electrode, the sample table and the near-local electrode are fixed by virtue of a machine, the near-local electrode can be effectively prevented from moving so that the near-local electrode works stably and reliably, and the equipment efficiency is effectively improved.

Description

technical field [0001] The invention relates to the technical field of three-dimensional atom probe equipment, in particular to a double-beam system sample stage for loading near-local electrodes. Background technique [0002] 3D Atom Probe is a high spatial resolution material characterization technique at the atomic scale. This technology can provide accurate composition information of materials in a small volume, and its application ranges from traditional metal materials to semiconductor nanoelectronic devices, and gradually extends to organic and biological materials, which is of great significance for the research and development of new materials. [0003] Based on the principle of "field evaporation", the three-dimensional atom probe applies a strong voltage pulse or laser pulse to the sample to ionize the surface atoms, and then accelerates to the detector along a specific projected trajectory under the action of the electric field force. The detector completes data...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/20H01J37/28
CPCH01J37/20H01J37/28
Inventor 沙刚吴琴莉靳慎豹胡蓉
Owner NANJING UNIV OF SCI & TECH
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