Method for improving precision of DMD (Digital Micromirror Device) maskless lithographic image
A technology of maskless lithography and image accuracy, which is applied in the field of improving DMD maskless lithography image accuracy and DMD maskless lithography image problems, and can solve the problems of high processing cost, increased hardware cost, cumbersome and complicated problems, etc. Achieve the effect of high cost performance, easy application, and improve image accuracy
Inactive Publication Date: 2019-03-19
金华飞光科技有限公司
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[0002] In traditional projection lithography, the production and processing of the photomask used in the exposure process is a relatively cumbersome and complicated process, which also has high requirements for the ma
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[0017] A method for improving the accuracy of DMD maskless lithography images as shown in the accompanying drawings is characterized in that: it includes using DMD to directly generate images, and exposing computer image data to wafers or PCB boards; Rotate at a certain angle along the X-axis or Y-axis at high speed, so that the DMD reflected light passes through the tilted lens and then the refracted light shifts half a pixel. Through the translation and superposition of four positions, a single pixel evolves into 4 images;
[0018] Among them, it also includes DMD-based maskless lithography technology using ultraviolet light as the initial light source; it also includes the rotation angle of the coated lens around the X-axis or Y-axis is θ, the thickness of the glass is t, and the refractive index of the lens is n. Calculate the translational distance Δy of the refracted light after the DMD reflected light passes through the inclined lens and the value is Δ It also includes...
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The invention discloses a method for improving the precision of a DMD (Digital Micromirror Device) maskless lithographic image. The method comprises the steps of directly generating an image by usinga DMD, exposing image data of a computer to a wafer or a PCB (Printed Circuit Board); and rotating a coating lens at a certain angle along an X axis or Y-axis at high speed through a control lens, sothat after reflected light of the DMD passes through the inclined lens, refracted light is shifted by half pixel, wherein the single pixel is evolved into four pixels by the translational superposition of four positions. According to the method for improving the precision of the DMD maskless lithographic image, the image precision can be improved only through the optical lens under a condition that the physical resolution of the DMD is constant. Therefore, the method for improving the precision of the DMD maskless lithographic image has the characteristics of high cost performance and small volume, has strong technical extensibility and process compatibility, meets the requirements of flexibility, high efficiency and low cost, is easy to apply in industry and has broad market prospects.
Description
technical field [0001] The invention relates to a problem of a DMD maskless lithography image, in particular to a method for improving the precision of a DMD maskless lithography image; it belongs to the field of semiconductor and PCB production equipment. Background technique [0002] In traditional projection lithography, the production and processing of the photomask used in the exposure process is a relatively cumbersome and complicated process, which also has high requirements for the mask and lithography process. In terms of mask lithography accuracy, it is to use higher resolution and higher precision DMD chips, or use multiple DMDs for splicing, and these methods also require increased hardware costs. Contents of the invention [0003] (1) Technical problems to be solved [0004] In order to solve the above problems, the present invention proposes a method for improving the image precision of DMD maskless lithography. [0005] (2) Technical solutions [0006] Th...
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CPCG03F7/2051G03F7/70383
Inventor 张琼谢俊立叶慧群金林枫
Owner 金华飞光科技有限公司