A laser interference lithography system
A laser interference lithography and laser technology, which is applied in the field of laser interference lithography system, can solve the problems of low system reliability, many light splitting elements, inconsistent light intensity, etc., and achieve high system reliability, simple light splitting elements, and light intensity equal effect
Active Publication Date: 2021-04-09
JILIN UNIV
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Problems solved by technology
[0004] Most of the current multi-beam laser interference lithography systems use a laser with a single beam output, use various beam splitting methods to split the original beam, and then use mirrors to reflect and intersect each split beam to obtain interference; but the existing laser The light intensity after splitting in the interference lithography system is not equal, there are too many splitting elements, it is difficult to adjust, and the system reliability is low
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[0045] see figure 1 , this application focuses on the use of a dual-output pulsed double-beam laser generating assembly 1 as a light source, which includes two sets of beam generating units 4, corresponding to two sets of beam shaping assemblies 2 and two sets of interference assemblies 3, in the beam splitting unit 9 Mirrors 15 are arranged on the side and on the same line, and each mirror 15 corresponds to a half-wave plate 16 .
[0046] After the two beams of laser light emitted by the double-beam laser generating component 1 are collimated by the beam expander and collimator unit 7, the beam shaping unit 8 homogenizes the Gaussian energy of the laser light so that it becomes a flat beam with uniform energy distribution. The top beam, and its spot shape is shaped into a square, so as to facilitate the splicing of the processing area. After splitting light at a reasonable angle through the beam splitting unit 9, the two beams of light become four beams of light in space, and...
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Abstract
The present application belongs to the technical field of micro-nano structure, and in particular relates to a laser interference lithography system. The existing laser interference lithography system has unequal light intensity after splitting, too many splitting elements, difficult adjustment, and low system reliability. The present application provides a laser interference lithography system, which includes sequentially arranged double-beam laser generating components, several beam shaping components, and several interference components; the double-beam laser generating component includes several beam generating units, and one of the beam generating units A polarizer and a Q switch are arranged between them; the beam shaping component includes a beam expander collimating unit and a beam shaping unit arranged in sequence; the interference component includes a beam splitting unit and a polarization state modulation unit. After splitting, the light intensity is equal, the splitting element is simple, easy to adjust, and the system has high reliability.
Description
technical field [0001] The present application belongs to the technical field of micro-nano structure, and in particular relates to a laser interference lithography system. Background technique [0002] Titanium alloys are widely used in dental implantology and orthopedics because of their excellent biocompatibility, biological inertness, and elastic modulus close to that of human bone. The surface morphology of titanium alloy implants is one of the important factors affecting osseointegration. In order to promote osseointegration, various physical and chemical methods are used to modify the surface of titanium alloy implants. Multi-beam laser interference lithography is a controllable and flexible surface modification method. The surface of titanium alloy implants treated by this method has a mixed structure from micron to nanometer scale, which is beneficial to improve titanium alloy implants as oral implants and The utility of orthopedic implant materials. [0003] The ...
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IPC IPC(8): G03F7/20G02B27/09G02B27/48
CPCG02B27/0905G02B27/0927G02B27/48G03F7/70408
Inventor 顾芯铭刘雨哲周延民
Owner JILIN UNIV