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Pressure-type flow control device, flow rate calculation method thereof, and flow rate control method

A flow control device, a pressure type technology, applied in the direction of flow control, flow control using electrical devices, measuring devices, etc., can solve problems such as large errors in the actual measurement results

Inactive Publication Date: 2020-06-23
FUJIKIN INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in this method, there is a problem that the error from the actual measurement result is large

Method used

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  • Pressure-type flow control device, flow rate calculation method thereof, and flow rate control method
  • Pressure-type flow control device, flow rate calculation method thereof, and flow rate control method
  • Pressure-type flow control device, flow rate calculation method thereof, and flow rate control method

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Experimental program
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Effect test

Embodiment

[0078] Experimental results are shown below, demonstrating the effectiveness of the present invention.

[0079] made with figure 1 In the device with the same structure, the mixed gas mixed with two gases is input to the control valve 3, the mixed gas is discharged from the predetermined orifice 5, and the pressure P of the gas in the upstream flow path 4 is actually measured as described above. 1 and temperature T 1 And calculate the flow coefficient FF. On the other hand, by the well-known build-up method, the same mixed gas flow rate Q is actually measured, and using this value, by Q=FF·S·P 1 (1 / T 1 ) 1 / 2 , Calculate the flow coefficient FF.

[0080] Table 1 is a table summarizing experimental results concerning various mixed gases.

[0081]

[0082] In the "Gas" column at the left end of Table 1, the ratio of the first gas is indicated on the left side of the oblique line ( / ), and the second gas is indicated on the right side of the oblique line. The ratio (%) of...

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Abstract

The present invention provides a pressure type flow control device (1), which adjusts the pressure P on the upstream side of the orifice (5). 1 maintained at the downstream side pressure P 2 In the state of about twice or more, the mixing ratio of the two gases constituting the mixed gas is X:(1-X), and it is calculated by weighting the densities, specific heat ratios, and gas constants of the two gases by the mixing ratio. The average density ρ of the mixed gas, the average specific heat ratio κ and the average gas constant R, by FF=(k / ρ){2 / (κ+1)} 1 / (κ‑1) [κ / {(κ+1)R}] 1 / 2 The flow coefficient FF of the mixed gas is calculated, and the cross-sectional area of ​​the orifice is S and the pressure of the mixed gas on the upstream side of the orifice is P. 1 , the temperature is set to T 1 , by Q=FF·S·P 1 (1 / T 1 ) 1 / 2 The flow rate Q of the mixed gas passing through the orifice is calculated.

Description

technical field [0001] The present invention relates to a pressure type flow control device used in a semiconductor manufacturing facility or a chemical plant, its flow calculation method, and a flow control method. In particular, it relates to a pressure type flow control device used for supplying a mixed gas mixed with a plurality of gases, Its flow calculation method and flow control method. Background technique [0002] In semiconductor manufacturing equipment, chemical plants, etc., it is required to supply gas with high precision. A mass flow controller (thermal mass flow controller) is known as a gas flow control device. [0003] Also, based on another principle, a pressure type flow control system is known as a gas flow control device having a simpler structure than a thermal mass flow controller. For example, Patent Documents 1 and 2 below disclose a pressure-type flow control device that adjusts the flow rate of an input gas through a control valve and discharges...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01F1/50G05D7/06
CPCG05D7/0635G01F15/005G01F1/50G05D7/06G05B19/416G05B2219/37371G05B2219/37399G05D7/0617
Inventor 永濑正明平田薰西野功二池田信一
Owner FUJIKIN INC