An adjustable rack plating electroplating tank
An electroplating tank and adjustment hanging technology, applied in the direction of electrolysis components, electrolysis process, etc., can solve the problems that the specific structure of the CCD bracket is not disclosed, the adjustable range of the CCD bracket is unknown, etc., to achieve accurate composition accuracy, expand the observation range, expand The effect of adjusting the range
Active Publication Date: 2020-11-03
ZHEJIANG IND & TRADE VACATIONAL COLLEGE
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Problems solved by technology
[0004] Although the CCD bracket of the observation part in the above-mentioned patent document is adjustable, there is no specific structure of the disclosed CCD bracket observation part, so the adjustable range of the CCD bracket of the observation part is unknown, so the adjustable hanger disclosed in the above-mentioned patent document There is no way to know the observation of the cathode plate plating parts in the electroplating tank
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[0053] In order to make the purpose, technical solution and advantages of the technical solution of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings of specific embodiments of the present invention.
[0054] Please see attached Figure 1 to Figure 8 ,Such as figure 1 A kind of adjustable hanging plating electroplating tank shown has CCD support 10, and described CCD support 10 is provided with a connecting frame 20, and described connecting frame 20 comprises connecting sleeve 201, expansion rod 202 and mounting base 203, and described connecting The sleeve 201 can be connected with the installation shaft 101 of the CCD bracket 10 through two pairs of plug-in components, the connection sleeve 201 can rotate relative to the installation shaft 101, and the connection sleeve 201 can be on the installation shaft 101 Sliding, thereby expanding the adjus...
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The invention discloses an adjustable rack plating electroplating bath. The electroplating bath comprises a CCD supporting frame, wherein a connecting frame is arranged on the CCD supporting frame, the connecting frame is provided with a CCD camera, the connecting frame comprises a connecting sleeve, a telescopic rod and a mounting base, the connecting sleeve can be connected with a mounting shaftof the CCD supporting frame through two pairs of plug-in assemblies, the connecting sleeve can rotate relative to the mounting shaft, the connecting sleeve can slide on the mounting shaft, a fixing rod of the telescopic rod is fixedly connected with the connecting sleeve, the mounting base is arranged at the end part of a moving rod of the telescopic rod, a camera mounting plate capable of rotating is arranged on the mounting base, and the camera mounting plate can be locked on the mounting base through a pair of locking assemblies. According to the adjustable rack plating electroplating bath, the structure is adopted, so that the real condition of the cathode plate plating piece can be more conveniently reflected, and various parameters of the plating piece can be adjusted by workers.
Description
technical field [0001] The invention relates to an electroplating tank, in particular to an adjustable rack plating electroplating tank. Background technique [0002] Electroplating tank The most basic equipment in the electroplating equipment, the main function is to install the solution. The use of the plating tank is arranged in a straight line according to the manual process of the production line, or according to local conditions and separated according to the site space. If it is a mechanical automatic production line, then Basically arranged according to the process flow. [0003] Chinese patent CN201620472026.0 discloses an adjustable rack plating electroplating tank, which includes a tank body and a drive assembly. The tank body has an electroplating cavity, and an anode substrate and a cathode substrate are arranged oppositely in the electroplating cavity. The driving assembly acts on the anode substrate or the cathode substrate to drive it to move vertically and ...
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IPC IPC(8): C25D17/00
CPCC25D17/00
Inventor 杨鹏温作锐钱世赟钱海燕
Owner ZHEJIANG IND & TRADE VACATIONAL COLLEGE