Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Baffle device for preventing light reflection in PIV (particle imagevelocimetry) experiments

A baffle device and reflective technology, applied in the field of macro PIV experiment, can solve the problems of reflection, uneven horizontal position, CCD camera burning, etc., and achieve the effects of wide application, low cost and simple structure

Inactive Publication Date: 2019-11-15
BEIJING UNIV OF TECH
View PDF22 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When performing macroscopic PIV experiments, such as the shooting of water and air turbulence near the wall flow field and the shooting of aortic valve blood flow, etc., the material of the channel and its horizontal position are not uniform, which causes the problem of reflection. When the reflection is serious , easy to burn the CCD camera

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Baffle device for preventing light reflection in PIV (particle imagevelocimetry) experiments
  • Baffle device for preventing light reflection in PIV (particle imagevelocimetry) experiments
  • Baffle device for preventing light reflection in PIV (particle imagevelocimetry) experiments

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The present invention will be described in detail below in conjunction with structural drawings and embodiments.

[0021] Such as Figure 1-5 Shown, the technical scheme that the present invention adopts is a kind of baffle device that is used for PIV experiment and avoids reflection, and the implementation process of this device is as follows,

[0022] a) In order to avoid reflection of the device, the materials used in this device are all black matte materials, in which the bottom plate (1), bracket (2) and fixing clip (11) are all black metal materials. The baffle (3) is made of black matte non-metal material that can be cut or replaced by black cardboard that can be cut, which not only reduces the cost, but also realizes the convenience of controlling multiple shapes.

[0023] b) In order to ensure the stability and levelness of the platform, a spirit level (10) is equipped above the bottom plate (1) to check whether the device is level, and the relative balance po...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a baffle device for preventing light reflection in PIV (particle imagevelocimetry) experiments, and belongs to the technical field of macro PIV experiments.Thebaffle device isused for preventinglight reflection in the PIV experiments. The device comprises a base part, a bracket part and a shooting baffle part, wherein brackets are connected with a base, the distance between the two brackets is adjusted by a sliding groove, and positions of the brackets are fastened by bolts; besides, the brackets are of a hollow sleeve structure and can be adjusted in height at any time; the shooting baffle part is fixed on the brackets by fixing clamps, theshape and position of a shooting hole can be adjusted according to the shooting plane. The device can achieve PIV shooting indifferent positions and in different shapes, avoids the influence of light reflection on experimental results, protects safety of a camera, ensures smooth development of the PIV experiments, and savestime and cost.

Description

technical field [0001] The invention relates to a baffle device used for particle image velocimetry (PIV for short) experiments to avoid light reflection, and belongs to the technical field of macroscopic PIV experiments. Background technique [0002] As a new non-interference, transient, non-contact, full-field velocity measurement method, PIV technology has extremely high academic significance and practical value in the field of fluid mechanics and aerodynamics research. The principle is that the velocity of the uniform tracer particles scattered in the flow field represents the velocity of the fluid at the corresponding position in the flow field. The laser sheet irradiates a test plane in the flow field, and the CCD camera is perpendicular to the test plane. Track the scattering effect of particles on light, record the position of particles during two pulse laser exposures, use image analysis technology to obtain the size and direction of particle displacement, and obtai...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01P5/20G01P1/00
CPCG01P1/00G01P5/20
Inventor 刘赵淼田琦李梦麒逄燕
Owner BEIJING UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com