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Super-resolution focusing device based on high refractive index material

A high-refractive-index, focusing device technology, applied in photoengraving process exposure device, pattern surface photoengraving process, microlithography exposure equipment and other directions, can solve the problems of weak absorption of indirect band gap materials, etc. The effect of simple optical path and easy material

Active Publication Date: 2021-07-30
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, an indirect bandgap material is a material that absorbs weakly, such as Si

Method used

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  • Super-resolution focusing device based on high refractive index material
  • Super-resolution focusing device based on high refractive index material
  • Super-resolution focusing device based on high refractive index material

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Experimental program
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Embodiment Construction

[0031] The overall technical idea of ​​the present invention is: generate a working beam by a laser; make a high-refractive index material into a lens-like structure with a size of 100 nanometers that can be focused, and place the lens-like structure with a size of 100 nanometers in the best position of the working beam; The focused spot focused for the first time is refocused through a high-refractive index lens structure; at the exit end of the high-refractive index lens structure, a super-resolution focused spot with a full width at half maximum of less than 100nm can be obtained.

[0032] Describe in detail below in conjunction with accompanying drawing and example, high-refractive index material is with silicon as example, and class lens structure is with hemisphere as example, and light source adopts high pressure mercury lamp H line (405nm), but the present invention is not limited to this (also can be used for ultraviolet and visible light).

[0033] like figure 1 As ...

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Abstract

The invention provides a super-resolution focusing device based on high refractive index material. The device includes a light source, a focusing element and a lens-like focusing structure. The light beam emitted by the light source is initially focused into focused light or parallel light by the focusing element, and then enters the lens-like focusing structure for further focusing. A focused spot of sub-wavelength size is formed; the material of the lens-like focusing structure adopts a material with a refractive index greater than 3. The device of the present invention can reduce the focused spot to λ / 10, and the focal depth of the focused spot can be further improved by using radially polarized light illumination. At the same time, the focused spot size can be maintained at λ / 8, and the focal depth can reach λ / 5, which is expected It is used in the fields of nanoscale super-resolution lithography, imaging and data storage.

Description

technical field [0001] The invention belongs to the field of laser beam focusing photolithography and imaging, in particular to a super-resolution focusing device based on high refractive index materials. Background technique [0002] Nanolithography technology has been widely used in the field of processing due to its advantages of large area, good repeatability and easy operation. Limited by the light diffraction limit Δx=λ / 2NA, the processing of nanoscale patterns cannot be directly realized by conventional optical exposure technology. In order to improve the machining accuracy, advance the diffraction limit, and improve the resolution, there are mainly two methods: [0003] The first is to reduce the wavelength of light used in optical exposure. At present, the most widely used are deep ultraviolet exposure technology (DUV) with wavelengths of 248nm and 193nm, and extreme ultraviolet exposure technology (EUV) with wavelength of 13.5nm. This type of technology has compl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/58G02B1/00G02B3/00G03F7/20
CPCG02B1/00G02B3/00G02B27/58G03F7/70325
Inventor 张伟华王中
Owner NANJING UNIV