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Super-resolution focusing device based on high-refractive-index material

A high-refractive-index, focusing device technology, applied in photo-engraving process exposure device, pattern-surface photo-engraving process, optics, etc., can solve the problem of weak absorption of indirect band gap materials, etc., achieve easy acquisition and preparation, simple optical path , The effect of low cost of light source

Active Publication Date: 2020-01-10
NANJING UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, an indirect bandgap material is a material that absorbs weakly, such as Si

Method used

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  • Super-resolution focusing device based on high-refractive-index material
  • Super-resolution focusing device based on high-refractive-index material
  • Super-resolution focusing device based on high-refractive-index material

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Embodiment Construction

[0031] The overall technical idea of ​​the present invention is: generate a working beam by a laser; make a high-refractive index material into a lens-like structure with a size of 100 nanometers that can be focused, and place the lens-like structure with a size of 100 nanometers in the best position of the working beam; The focused spot focused for the first time is refocused through a high-refractive index lens structure; at the exit end of the high-refractive index lens structure, a super-resolution focused spot with a full width at half maximum of less than 100nm can be obtained.

[0032] Describe in detail below in conjunction with accompanying drawing and example, high-refractive index material is with silicon as example, and class lens structure is with hemisphere as example, and light source adopts high pressure mercury lamp H line (405nm), but the present invention is not limited to this (also can be used for ultraviolet and visible light).

[0033] Such as figure 1 ...

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Abstract

The invention provides a super-resolution focusing device based on a high-refractive-index material. The device comprises a light source, a focusing element and a lens-like focusing structure; a lightbeam emitted by the light source is primarily focused into focusing light or parallel light through the focusing element and then enters the lens-like focusing structure to be further focused, and afocusing light spot with a sub-wavelength size is formed on a focusing surface of the lens-like focusing structure; the lens-like focusing structure is made of a material with the refractive index being greater than 3. According to the device, the focusing light spot can be shrunk to lambda / 10, and the focal depth of the focusing light spot can be further increased in a radial polarized light illumination mode, wherein the size of the focusing light spot can be kept lambda / 8, and the focal depth can reach lambda / 5. The device is expected to be applied to the fields of nanoscale super-resolution photoetching technologies, imaging, data storage and the like.

Description

technical field [0001] The invention belongs to the field of laser beam focusing photolithography and imaging, in particular to a super-resolution focusing device based on high refractive index materials. Background technique [0002] Nanolithography technology has been widely used in the field of processing due to its advantages of large area, good repeatability and easy operation. Limited by the light diffraction limit Δx=λ / 2NA, the processing of nanoscale patterns cannot be directly realized by conventional optical exposure technology. In order to improve the machining accuracy, advance the diffraction limit, and improve the resolution, there are mainly two methods: [0003] The first is to reduce the wavelength of light used in optical exposure. At present, the most widely used are deep ultraviolet exposure technology (DUV) with wavelengths of 248nm and 193nm, and extreme ultraviolet exposure technology (EUV) with wavelength of 13.5nm. This type of technology has compl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/58G02B1/00G02B3/00G03F7/20
CPCG02B27/58G02B1/00G02B3/00G03F7/70325
Inventor 张伟华王中
Owner NANJING UNIV