Data processing method and device
A data processing and data technology, applied in the field of data processing methods and devices, can solve the problems of limited position calculation accuracy, limited acquisition frequency, limited number of sampling points, etc. The effect of computing time
Active Publication Date: 2022-02-11
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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[0003] The existing alignment system usually has a limited acquisition frequency during the photoelectric conversion process, and the number of sampling points is limited within a fixed sampling time, which limits the calculation accuracy of the position solution.
At the same time, with the continuous complexity of filtering algorithms and numerical fitting algorithms, and the increase in the number of sampling points, the time complexity of numerical algorithms increases accordingly
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[0055] In order to make the purpose, features, and advantages of the application more obvious and understandable, the technical solutions in the embodiments of the application will be clearly and completely described below in conjunction with the drawings in the embodiments of the application. Obviously, the described The embodiments are only some of the embodiments of the present application, but not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.
[0056] see figure 1 , figure 1 It is a schematic flowchart of a data processing method provided by an embodiment of the present application. The method can be applied to an alignment system of a lithography machine. The alignment system includes an alignment light source, an alignment sensor, a detection module, and a data processing module. The method mainly includes the fo...
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A data processing method applied in the field of integrated circuit technology, comprising: using two channels to alternately collect light intensity signals, respectively performing demodulation, filtering and normalization processing on the light intensity signals collected by the two channels to obtain multiple data For each data packet, data fitting is performed on each data packet using a parallel computing method to obtain alignment mark position values of each data packet, and position data fusion is performed on the alignment mark position values of each data packet to obtain alignment positions. The application also discloses an alignment system for a lithography machine, which can improve the accuracy and calculation speed of alignment position calculation.
Description
technical field [0001] The present application relates to the technical field of integrated circuits, and in particular to a data processing method and device. Background technique [0002] Overlay accuracy is one of the three key technical indicators of lithography equipment, and the performance of the alignment system directly determines the technical level of overlay accuracy. The alignment sensor is a key component of the alignment system of the lithography machine. Its function is to obtain the relative position of the current wafer alignment mark in the coordinate system of the position measurement system of the lithography machine online, so as to establish the The positional relationship between the stations. [0003] The existing alignment system usually has limited acquisition frequency during the photoelectric conversion process, and the number of sampling points is limited within a fixed sampling time, which limits the calculation accuracy of position calculatio...
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IPC IPC(8): G03F9/00G06K9/62
CPCG03F9/7046G03F9/7092G06F18/25
Inventor 李璟武志鹏赵晓东卢增雄折昌美谢冬冬
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI