Mask wearing condition monitoring method based on face and posture recognition

A face detection and mask technology, applied in the field of image processing, can solve the problems that the protective effect of masks is not effectively exerted, increase the risk of infection, and consume human resources, so as to reduce the probability of droplet transmission, reduce the risk of infection, and save manpower. The effect of resources

Active Publication Date: 2020-08-11
ZHEJIANG UNIV OF TECH
View PDF4 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to some reasons, some people do not wear masks or do not wear masks correctly, and they have wrong behaviors after wearing masks, so that the protective effect of masks has not been effectively exerted.
In response to these s...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask wearing condition monitoring method based on face and posture recognition
  • Mask wearing condition monitoring method based on face and posture recognition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] The embodiment of the mask wearing situation monitoring method based on face and gesture recognition of the present invention will be described in detail below with reference to the accompanying drawings, so that the purpose, technical solution and a bit of the present invention are clearer.

[0030] refer to figure 1 and figure 2 , a mask wearing situation monitoring method based on face and gesture recognition, comprising the following steps:

[0031] Step 1: Obtain surveillance video;

[0032] Step 2: Perform face detection on the image in the video data to detect whether there is a human face in the image, if there is no human face in the image, return to step 1;

[0033] The face detection process is: every certain number of frames extract image data from the video data, detect the face in the image, and return the size, position and quantity of the face detection frame if there is a face;

[0034] Step 3: If there is a human face in the image, then identify th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a mask wearing condition monitoring method based on face and posture recognition. The mask wearing condition monitoring method comprises the following steps of: step 1, acquiring a monitoring video; step 2, performing face detection on an image in the video data, and detecting whether a face exists in the image or not; step 3, if a face exists in the image, identifying theface and performing identity authentication, determining a target identity corresponding to the face, and if all target identities cannot be determined, returning to the step 1; step 4, performing mask detection on a detected face region, and detecting whether the target wears a mask or not and whether the target wears the mask correctly or not; step 5, if the target does not wear the mask or doesnot wear the mask correctly, transmitting a prompt to the target; and step 6, performing posture detection on the target, if a hand touches mouth and nose regions, sending a prompt to the target, andotherwise, continuing the posture detection. According to the mask wearing condition monitoring method, the condition of mask wearing can be automatically monitored and reminded, and the bad habit ofwearing the mask can be corrected.

Description

technical field [0001] The invention relates to the fields of image processing and target detection, in particular to a method for monitoring mask wearing conditions based on face and gesture recognition. Background technique [0002] A mask is a common sanitary protective product. It can filter the air entering the nose and mouth by simply wearing it. It has a significant effect on blocking dust, droplets, harmful gases, etc. It is mostly used in factories, construction sites, hospitals, etc. Where filtering is performed. For the prevalence of infectious diseases, wearing a mask is a good way to block the spread of infectious diseases through droplets, and it needs to be worn by all staff. However, due to some reasons, some people do not wear masks or do not wear masks correctly, and they have wrong behaviors after wearing masks, so that the protective effect of masks has not been effectively exerted. In response to these situations, we need to properly remind these perso...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06K9/00G08B21/24G06F21/32
CPCG08B21/24G06F21/32G06V40/172G06V40/28G06V40/161G06V40/20G06V20/40
Inventor 吴哲夫李玮毅吴昌泽逯小莹肖新宇
Owner ZHEJIANG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap