Cleaning device and cleaning method

A cleaning device and a technology to be cleaned are applied in cleaning methods and utensils, chemical instruments and methods, cleaning methods using liquids, etc., which can solve the problems of mask overwashing, loss, and low mask cleaning efficiency, and achieve Avoid secondary cleaning, improve cleaning efficiency, and avoid the effect of overwashing

Pending Publication Date: 2020-10-02
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, the inventor found that in the prior art, the cleaning time cannot be adjusted accurately for different masks, resulting in low cleaning efficiency of the mask, or the mask is overwashed to cause loss

Method used

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  • Cleaning device and cleaning method
  • Cleaning device and cleaning method
  • Cleaning device and cleaning method

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Embodiment Construction

[0022] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the following will describe each embodiment of the present invention in detail with reference to the accompanying drawings. However, those of ordinary skill in the art can understand that, in each implementation manner of the present invention, many technical details are provided for readers to better understand the present application. However, even without these technical details and various changes and modifications based on the following implementation modes, the technical solution claimed in this application can also be realized.

[0023] The first embodiment of the present invention relates to a cleaning device, including: a detection vibrator and a cleaning vibrator located in the cleaning tank, and a controller connected to the detection vibrator and the cleaning vibrator, and the detection vibrator detects residues on the mask to be cleaned p...

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Abstract

The embodiment of the invention relates to the technical field of cleaning equipment, and discloses a cleaning device and a cleaning method. The cleaning device comprises a cleaning tank, a detectionoscillator and a cleaning oscillator which are located in the cleaning tank, and a controller which is connected with the detection oscillator and the cleaning oscillator; the detection oscillator isused for detecting the position of residues on the to-be-cleaned mask; and the controller is used for controlling the cleaning vibrator to clean the to-be-cleaned mask according to the position of theresidue, so that the cleaning efficiency of the mask is improved while the mask is prevented from being overwashed.

Description

technical field [0001] The embodiments of the present invention relate to the technical field of cleaning equipment, in particular to a cleaning device and a cleaning method. Background technique [0002] The mask plate needs to be cleaned before it can be used to make chips. In the conventional cleaning method, the mask is placed in the tank, which contains cleaning liquid. The tank is rectangular, and the bottom and the four side walls connected to the bottom are all flat. The bottom of the tank is placed A vibrator that can generate ultrasonic waves. The ultrasonic waves are dense and dense on the transmission path. Cavitation will occur between the dense and dense parts, and small bubbles will be generated and burst. The blasting force generated when the bubbles burst can clean the mask. . [0003] However, the inventors found that in the prior art, the cleaning time cannot be accurately adjusted for different masks, resulting in low cleaning efficiency of the mask, or...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/82G03F1/84B08B3/08B08B3/12B08B13/00G01N29/07
CPCG03F1/82G03F1/84B08B3/08B08B3/12B08B13/00G01N29/07G01N2291/106
Inventor 袁亚鸿杨阳古春笑
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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