Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Covering structure for extremely-low-radioactivity solid waste landfill

A solid waste, covering structure technology, applied in infrastructure engineering, protection devices, buildings, etc., can solve the problems of large quantity, high degree of harm, low level of radioactivity, etc., achieve strong absorption and isolation, prevent pollution, prevent The effect of outward migration

Pending Publication Date: 2021-01-12
BEIJING GEOENVIRON ENG & TECH
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Very low-level radioactive solid waste is a kind of radioactive solid waste. Although its radioactive level is low, it can be disposed of in shallow waste landfills, but it contains a large amount of substances with a small amount of radioactivity, which has potential risks to human health and the environment. Hazard exists for a long time, and the degree of harm is large

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Covering structure for extremely-low-radioactivity solid waste landfill

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0064] figure 1 A schematic structural diagram of a covering structure for a very low-level radioactive solid waste landfill of this embodiment is shown.

[0065] Such as figure 1 As shown, the covering structure for very low-level radioactive solid waste landfill includes filling layer 2, soil layer 3, clay layer 4, sodium-based bentonite cushion layer (GCL) 5, and high-density polyethylene film layer from bottom to top. (HDPE film) 6, drainage layer 7, supporting soil layer 8, nutrient soil layer 9 and vegetation 10;

[0066] The filling layer 2 includes bentonite and graded gravel, and the particle size of the graded gravel is 0.25mm-5mm, which is filled in the space between and around the sealed storage tanks 1 containing extremely low-level radioactive solid waste. The top of the sealed storage tank 1 with extremely low-level radioactive solid waste, the average thickness of the soil layer 3 is ≥500mm, and the permeability coefficient is ≤1·10 -5 cm / s to prevent the sp...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a covering structure for an extremely-low-radioactivity solid waste landfill. The covering structure comprises an isolating layer, an impermeable layer, a drainage layer and agreening soil layer; gaps between sealed storage tanks filled with extremely-low-radioactivity solid waste and gaps at the peripheries of the sealed storage tanks are filled with the isolating layer,and the isolating layer covers the tops of the sealed storage tanks filled with the extremely-low-radioactivity solid waste, so that the extremely-low-radioactivity solid waste after landfill is prevented from being diffused after leakage; the impermeable layer covers the isolation layer and is used for preventing surface water from permeating into the isolation layer; the drainage layer covers the impermeable layer and is used for guiding and draining water blocked by the impermeable layer out of a landfill area; and the greening soil layer covers the drainage layer and is used for planting vegetation. The covering structure is applied to final coverage of the extremely-low-radioactivity solid waste landfill, pollution of the extremely-low-radioactivity solid waste to the surrounding environment is avoided, and convenience is provided for subsequent development and utilization of the landfill and nearby land.

Description

technical field [0001] The invention belongs to the technical field of extremely low-level radioactive solid waste treatment, and more particularly relates to a covering structure for extremely low-level radioactive solid waste landfills. Background technique [0002] With the development of the economy, people's awareness of environmental protection has gradually increased, especially the occurrence of the Fukushima nuclear leakage incident in Japan, which has made the safe disposal of radioactive solid waste a focus of attention in the world. Solid radioactive waste is mainly produced in industries such as nuclear weapons, nuclear fuel, and medical applications, and contains elements such as tritium, cobalt-60, strontium-90, uranium-235, and plutonium-239. Very low-level radioactive solid waste is a kind of radioactive solid waste. Although its radioactive level is low, it can be disposed of in shallow waste landfills, but it contains a large amount of substances with a sm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): E02D31/00E02D31/02
CPCE02D31/00E02D31/02
Inventor 罗彬甄胜利齐长青王洋于肖肖田素芳贺真
Owner BEIJING GEOENVIRON ENG & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com