Unlock instant, AI-driven research and patent intelligence for your innovation.

Substrate processing method and substrate processing apparatus

A substrate processing method and substrate processing device technology, applied in cleaning methods and tools, chemical instruments and methods, cleaning methods using liquids, etc., can solve problems such as difficult substrates, and achieve the effect of improving quality

Pending Publication Date: 2021-03-23
DAINIPPON SCREEN MTG CO LTD
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is sometimes difficult for the processing unit of the conventional substrate processing apparatus to properly process the substrate.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate processing method and substrate processing apparatus
  • Substrate processing method and substrate processing apparatus
  • Substrate processing method and substrate processing apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0332] Next, the substrate processing apparatus of the present invention will be described with reference to the drawings.

[0333]

[0334] figure 1 It is a plan view of the substrate processing apparatus of embodiment. The substrate processing apparatus 1 processes a substrate W. As shown in FIG.

[0335] The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for organic EL (Electroluminescence), a substrate for FPD (Flat Panel Displa), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, a substrate for a magneto-optical disk, or a photomask Substrates or substrates for solar cells.

[0336] The substrate processing apparatus 1 has an indexer unit 2 . The indexer unit 2 has a plurality (for example, four) of rack mounting units 3 . One storage rack C is placed on each storage rack mounting portion 3 . The storage rack C accommodates a plurality of substrates W. As ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The purpose of the present invention is to provide a substrate processing method and a substrate processing apparatus capable of suitably processing a substrate. The invention relates to a substrate processing method and a substrate processing apparatus (1). The substrate processing method includes a step (S39) of supplying a processing liquid to a substrate (W) supported by a fixing pin (103) ata position above an upper surface (102) of a first plate (101). In the step (S39) of supplying the processing liquid to the substrate (W), gas is blown upward from the first blow-out port (105), and gas is blown upward from the second blow-out port (106). The first blow-out port (105) is formed in the center of the upper surface (102) of the first plate (101). The second blow-out port (105) is formed at the peripheral edge of the upper surface (102) of the first plate (101). The second blow-out port (106) blows out the gas at a flow rate greater than that of the first blow-out port (105).

Description

technical field [0001] The invention relates to a substrate processing device and a substrate processing method for processing a substrate. Substrates are, for example, semiconductor wafers, substrates for liquid crystal displays, substrates for organic EL (Electroluminescence: electroluminescence), substrates for FPD (Flat Panel Display: flat panel displays), substrates for optical displays, substrates for magnetic disks, substrates for optical disks, magneto-optical disks Substrates, substrates for photomasks, or substrates for solar cells. Background technique [0002] Japanese Patent Application Laid-Open No. 2015-65226 discloses a substrate processing apparatus. Hereinafter, reference numerals described in JP-A-2015-65226 are described in parentheses. A substrate processing apparatus has a turntable (10) on which a substrate (100) is placed. The turntable (10) has an upper surface portion (13) and a chuck portion (14). The upper surface part (13) and the chuck part ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/6715H01L21/67288H01L21/67017H01L21/02052H01L21/67051H01L21/68728H01L21/68742H01L21/6875B08B3/02
Inventor 中泽和彦高山祐一森冈利仁蒲裕充佐藤卓也日野出大辉菊本宪幸坂田健典太田乔
Owner DAINIPPON SCREEN MTG CO LTD