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Substrate processing apparatus

A substrate processing device and substrate technology, which is applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve problems such as difficult-to-handle substrates

Pending Publication Date: 2021-03-23
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is sometimes difficult to properly process the substrate in the processing unit of the conventional substrate transfer device.

Method used

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Embodiment Construction

[0255] Next, the substrate processing apparatus of the present invention will be described with reference to the drawings.

[0256]

[0257] figure 1 It is a plan view of the substrate processing apparatus of embodiment. The substrate processing apparatus 1 processes a substrate W. As shown in FIG.

[0258] The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for organic EL (Electroluminescence), a substrate for FPD (Flat Panel Displa), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, a substrate for a magneto-optical disk, or a photomask. Substrates or substrates for solar cells.

[0259] The substrate processing apparatus 1 has an indexer unit 2 . The indexer unit 2 has a plurality (for example, four) of rack mounting units 3 . One storage rack C is placed on each storage rack mounting portion 3 . The storage rack C accommodates a plurality of substrates W. As...

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Abstract

The purpose of the present invention is to provide a substrate processing device capable of suitably processing a substrate. A substrate processing apparatus (1) includes a first processing unit (7A)and a second processing unit (7B). The first processing unit (7A) includes a first substrate holding portion (91A) and a first rotation driving portion (92A). The first substrate holding section (91A)has a first plate (101), a fixing pin (103), and a gas outlet (104). The second processing unit (7B) has a second plate (131) and an end edge contact pin (133). A substrate processing apparatus (1) includes a transport mechanism (8) and a control unit (9). The transport mechanism (8) transports the substrate (W) to the processing unit (7). The control unit (9) specifies a processing unit (7) forprocessing the substrate (W) as either the first processing unit (7A) or the second processing unit (7B) in accordance with the shape of the substrate (W), and transports the substrate (W) to the specified processing unit (7) by means of the transport mechanism (8).

Description

technical field [0001] The invention relates to a substrate processing device for processing a substrate. Substrates are, for example, semiconductor wafers, substrates for liquid crystal displays, substrates for organic EL (Electroluminescence: electroluminescence), substrates for FPD (Flat Panel Display: flat panel displays), substrates for optical displays, substrates for magnetic disks, substrates for optical disks, and substrates for magneto-optical disks. Substrates, substrates for photomasks, or substrates for solar cells. Background technique [0002] Japanese Patent Application Laid-Open No. 2007-149892 discloses a substrate processing apparatus. Hereinafter, reference numerals described in JP-A-2007-149892 are described in parentheses. A substrate processing apparatus (100) has a substrate transfer robot (CR) and four cleaning processing units (5a, 5b, 5c, 5d). The substrate transport robot (CR) transports the substrate (W) to any one of the cleaning processing u...

Claims

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Application Information

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IPC IPC(8): H01L21/683H01L21/687H01L21/67
CPCH01L21/67253H01L21/67155H01L21/6838H01L21/68792H01L21/68785H01L21/67745H01L21/68728H01L21/6875H01L21/68764H01L21/67742
Inventor 高山祐一中泽和彦蒲裕充森冈利仁佐藤卓也
Owner DAINIPPON SCREEN MTG CO LTD