A rectification device for preparing electronic grade carbon tetrafluoride

A carbon tetrafluoride, electronic-grade technology, which is applied in the preparation of halogenated hydrocarbons, fractionation, organic chemistry, etc., can solve the problem that the structural structure and control strategy, design principle, and design application of the undisclosed functional parts cannot be realized, and the precision cannot be stably controlled. Problems such as the temperature of the distillation tower can be solved to save energy, improve the structure of the condenser, and achieve the effects of high-efficiency rectification

Active Publication Date: 2022-05-03
FUJIAN DEER TECH CORP
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Problems solved by technology

[0005] However, the above-mentioned prior art only gives the component composition of the rectification device, and does not disclose the specific structural configuration, control strategy, and design principle of each functional component, which makes it impossible for those skilled in the art to realize
In addition, the above existing technologies cannot produce high-purity carbon tetrafluoride products that meet the needs of the semiconductor industry. Combined with product technical indicators, the temperature of the rectification tower cannot be stably controlled to achieve efficient distillation and save energy.

Method used

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  • A rectification device for preparing electronic grade carbon tetrafluoride
  • A rectification device for preparing electronic grade carbon tetrafluoride
  • A rectification device for preparing electronic grade carbon tetrafluoride

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Embodiment Construction

[0027] The rectifying device for preparing electronic-grade carbon tetrafluoride disclosed by the present invention is substantially the same in structure as the rectifying device structure of a utility model patent that the applicant has applied for, so the present invention is attached Figure 1-2 And the structural description of the rectifying device mostly adopts the content therein, but, the rectifying device of the present invention is relative to the rectifying device applied by the applicant, in terms of details, its structure, structure and design method are all different with it, Therefore, the present invention is obtained through the creative efforts of those skilled in the art on the basis of the prior art (the prior art also belongs to the content disclosed by the applicant). In the following, we describe the same technical features of the present invention as the prior art, and at the same time provide a further description of the creative improvements to the pr...

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Abstract

It is used to prepare electronic grade carbon tetrafluoride rectification equipment, including a top condenser, a refining section, and a reboiler. One end of the refining section is connected to a top condenser, and the other end communicates with the reboiler. The reboiler A horizontal double-tube heat exchanger is installed in the reboiling chamber, and a partition is provided between the inlet and outlet heads of the heat medium. The outer side of the partition is provided with a flange that is movably connected Welded horizontal double-tube heat exchanger; the refining section includes a refining section plate, a feed plate, and a section kettle; after the liquid phase in the refining section enters the section kettle from top to bottom, a part of the liquid enters the reboiler and is vaporized into The ascending steam is refluxed into the refining section, and a part of it will be extracted as a section kettle product; the overhead condenser condenses the entering vapor phase into a liquid to provide reflux liquid for the refining section, and part of the condensate is extracted from the top of the refining section.

Description

technical field [0001] The invention relates to a chemical production device, in particular to a rectification device for preparing electronic grade carbon tetrafluoride, which belongs to the technical field of chemical equipment. Background technique [0002] Carbon tetrafluoride (CF4) is currently the most used plasma etching gas in the microelectronics industry. It is widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass, and tungsten. It is used for cleaning the surface of electronic devices. , the production of solar cells, laser technology, low-temperature refrigeration, gas insulation, leak detection agents, controlling the attitude of space rockets, detergents, lubricants and brake fluids in the production of printed circuits, etc. are also widely used. Due to its strong chemical stability, CF4 can also be used in metal smelting and plastic industries. [0003] In recent years, due to the developme...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D3/14B01D3/32B01D3/42C07C17/383C07C19/08
CPCB01D3/14B01D3/322B01D3/42C07C17/383C07C19/08
Inventor 华祥斌阙祥育张国聪林百志王凤侠王雯霖
Owner FUJIAN DEER TECH CORP
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