Thermal undercut structure for metasurface tuning
A technology of metasurfaces and substrates, which is used in the structure of active regions, instruments, semiconductor lasers, etc.
Pending Publication Date: 2021-06-18
LUMINAR TECH INC
View PDF0 Cites 1 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
There are many challenges in creating a metasurface resonator element with a high quality factor that can deliver large Δn at a rate fast enough to be suitable for the corresponding technological application.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
example 1
[0068] Example 1. A metasurface comprising:
[0069] a plurality of periodically repeating unit cells disposed on a substrate, each of the unit cells comprising:
[0070] High index dielectric blocks;
[0071] a heat source positioned to selectively modulate heat applied to the high index dielectric block; and
[0072] An insulating undercut region at the interface between the high index dielectric block and the substrate.
example 2
[0073] Example 2. The metasurface of Example 1, wherein the heat source comprises an electrode separated from the high-index dielectric block by a spacer layer.
example 3
[0074] Example 3. The metasurface of Example 2, wherein the spacer layer is diamond-like carbon.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
Disclosed is a thermal undercut structure for metasurface tuning. An active metasurface includes a number of periodically-repeated unit cells arranged on a substrate, each of the unit cells including a high-index dielectric block; a heat source positioned to selectively modulate heat applied to the high-index dielectric block; and an insulating undercut region at an interface between the high-index dielectric block and the substrate.
Description
[0001] Cross References to Related Applications [0002] This application claims priority to U.S. Provisional Patent Application Serial No. 62 / 948,234, entitled "Tunable Metasurfaces for Beam Steering," filed December 14, 2019, which is specifically incorporated by reference for all that it discloses or teaches . Background technique [0003] Optical metasurfaces can locally impose changes in the amplitude, phase, and polarization of propagating electromagnetic (EM) waves. These surfaces can be designed to operate in transmissive or reflective modes to perform functionalities such as beam focusing, steering and other kinds of wavefront manipulation. High-performance dynamic metasurfaces are currently believed to have applications in industries such as holography for lidar, variable-focus planar lenses, and beam steering. [0004] The performance capabilities of dynamic metasurfaces are typically described in terms of field of view (eg, range of potential beam steering angles...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/32H01S5/343
CPCH01S5/34H01S5/323H01S5/343H01S5/04256G02F1/3133G02F1/292G02B1/002G02B5/008G02B26/06G02F2202/30G02B1/007G01S7/481G01S7/4814G01S7/4817G02B6/1226G02B27/0087
Inventor A·贾殷Z·詹德瑞克D·莫尔K·A·戈麦斯K·苏布拉马尼亚姆
Owner LUMINAR TECH INC



