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Apparatus for removing particles using symmetrical gas injection

A gas injection and gas nozzle technology, which is applied in the cleaning method using gas flow, dispersing particle filtration, removing smoke and dust, etc., can solve the problems of staff inhalation and pollution, and achieve the effect of smooth collection and recovery, accurate detection and counting.

Pending Publication Date: 2021-06-18
金镇浩
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] However, the particles separated from the substrate are diffused to the surrounding by the jet gas flow to cause contamination. Even after the jet work is completed, the particles may be reattached to other positions of the substrate being transferred by the gas flow, and contamination occurs again, and it is difficult to clean the particles. Accurate recovery, detection and counting, with the risk of staff inhalation during work

Method used

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  • Apparatus for removing particles using symmetrical gas injection
  • Apparatus for removing particles using symmetrical gas injection
  • Apparatus for removing particles using symmetrical gas injection

Examples

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Embodiment Construction

[0022] Hereinafter, specific contents for implementing the particle removal apparatus using symmetrical gas injection according to the present invention will be described in detail centering on examples with reference to the drawings.

[0023] The particle removal apparatus utilizing symmetrical gas jets according to the present invention is used to efficiently remove particles from the surface of an object for recovery in a clean room or the like, cf. figure 1 , the particle removal device using symmetrical gas injection includes a casing 100, a gas injection part 200, a recovery part 300, and may optionally include a second recovery part 400, a direction guide nozzle 500, a gas injection part 600, a particle detection part 700, The control unit 800 .

[0024] refer to figure 2 , the casing 100 may have an inner space, which is arranged in a vertical or horizontal direction, and provides a space for guiding the particles P separated from the surface of the object to the rec...

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Abstract

The present invention provides an apparatus for removing particles using symmetrical gas injection, the apparatus comprising: a casing having an inner space; a gas injection part in which a plurality of gas nozzles are formed on one side of the casing, the plurality of gas nozzles are disposed symmetrically and away from an object, and particles on the surface of the object are removed by means of injecting gas on the object; and a recovery part which has a recovery pipe inserted therein and connected to the other side of the casing and is for recovering, via the recovery pipe, the particles which have been removed from the object. According to the present invention, the gas nozzles inject in symmetrical directions and thus diffusion of particles removed from the surface of the object is prevented, the object is not contaminated, and the particles can accurately be recovered, detected and counted.

Description

technical field [0001] The present invention relates to a particle removal device, and more specifically, to a particle removal device using symmetrical gas jets for efficiently removing particles from the surface of an object for recovery in a clean room or the like. Background technique [0002] In general, with the advancement of industry, the need to control dust and other particles not only in the office environment but also in the production site is also increasing. In order to keep the production site in a clean state and prevent the adverse effects of particles on the product, Introduced into the clean room. [0003] Such clean rooms are introduced and operated in industries such as semiconductors, displays, pharmaceuticals, and hospitals, and in scientific research laboratories. Especially in high-tech industries that include highly precise processes at the nanometer level, such as semiconductor or LCD display manufacturing processes, even the production of products...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/02
CPCH01L21/67017H01L21/67028H01L21/02B01D46/543B08B5/02B08B13/00B08B15/04
Inventor 金镇浩
Owner 金镇浩
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