Preparation method, device and equipment of coplanar waveguide structure and superconducting device

Abstract

The embodiment of the invention provides a preparation method, device and equipment of a coplanar waveguide structure and a superconducting device. The method comprises the steps of obtaining a to-be-etched structure, wherein the to-be-etched structure comprises an aluminum thin film located on a substrate structure and a photoresist structure located at the upper end of the aluminum thin film and used for covering a partial region of the aluminum thin film, performing a first etching operation on the aluminum thin film on the substrate structure by using an acid solution to obtain a first etched structure, washing the first etched structure to obtain an intermediate structure, performing second etching operation on the intermediate structure by using an alkaline solution to obtain a second etched structure, washing the second etched structure and acquiring a target structure, wherein the target structure comprises an aluminum thin film located on the substrate structure and the photoresist structure located at the upper end of the aluminum thin film, and the photoresist structure covers all areas of the aluminum thin film. According to the technical scheme provided by the embodiment of the invention, the edge flatness of the aluminum-based microwave waveguide device is improved, and the generation quality and effect of the superconducting quantum device are ensured.

Description

technical field [0001] The invention relates to the field of superconducting technology, in particular to a preparation method, device, equipment and superconducting device of a coplanar waveguide structure. Background technique [0002] Wet etching is a method of processing micro-nano-sized structures through mask protection and chemical reaction. It is a commonly used processing method in the field of micro-nano processing. It has the advantages of simple implementation and low cost. At the same time, the above-mentioned implementation methods also have Certain chemoselectivity. In the wet preparation process of aluminum-based superconducting quantum microwave waveguides, some micro-nano-scale particulate impurities are often left due to the selectivity of chemical corrosion. The charging effect of these impurities will interfere with the signal of quantum devices, which will affect the Fabrication quality and effectiveness of quantum devices. Contents of the invention ...

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Problems solved by technology

In the wet preparation process of aluminum-based superconducting quantum microwave waveguides, some micro-nano-scale particulate impurities are often left due to the selectivity of c

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