Surface modification method of quartz glass rotary workpiece processed by droplet adhesion chemical processing
A quartz glass and chemical processing technology, applied in the field of surface modification of quartz glass revolving workpieces, can solve the problems of complex operation, stress concentration and high cost
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Embodiment 1
[0056] The purpose of this example is to carry out chemical processing of droplets on the quartz glass rotary body to obtain a quartz glass rotary body without microcracks, no metamorphic layer, and a smooth surface. The final surface roughness Ra value of the quartz glass rotary body workpiece not more than 50nm. refer to Figure 7 , The selected feature of the quartz glass rotary workpiece to be processed is the end face part, the radius of gyration is 7.5-10mm, and the specific material model is Corning7980. The selected quartz glass revolving workpiece has a surface roughness Ra value of 0.5 μm. The selected etching solution is buffer oxide etching solution (the composition after configuration is 3wt% HF, 30wt% NH 4 F). The main steps are as follows:
[0057] 1) The quartz glass workpiece is clamped on the precision rotating spindle (radial runout ≤ 0.005mm), so that it can rotate around the center line;
[0058] 2) Using the liquid supply system, a droplet with a rad...
Embodiment 2
[0064] The purpose of this example is to carry out chemical processing of droplets on the quartz glass rotary body to obtain a quartz glass rotary body without microcracks, no metamorphic layer, and a smooth surface. The final surface roughness Ra value of the quartz glass rotary body workpiece not more than 50nm. refer to Figure 8 , The selected feature of the quartz glass revolving workpiece to be processed is an outer spherical surface with a radius of 10mm, and the radius of gyration is in the range of 2-10mm. The specific material model is Corning7980. The selected quartz glass revolving workpiece has a surface roughness Ra value of 0.5 μm. The selected etching solution is buffer oxide etching solution (the composition after configuration is 3wt% HF, 30wt% NH 4 F). The main steps are basically the same as in Example 1, and the difference between the two is only in step 4) and step 5), and step 4) and step 5) in this embodiment are expressed as follows:
[0065] 4) Co...
Embodiment 3
[0068] The purpose of this example is to carry out chemical processing of droplets on the quartz glass rotary workpiece to obtain a quartz glass rotary workpiece without microcracks, no metamorphic layer, and a smooth surface. The final surface roughness Ra value of the quartz glass rotary workpiece not more than 50nm. refer to Figure 9 , The selected feature of the quartz glass revolving workpiece to be processed is an inner spherical surface with a radius of 9mm, and the radius of gyration is in the range of 2-9mm. The specific material model is Corning7980. The selected quartz glass revolving workpiece has a surface roughness Ra value of 0.5 μm. The selected etching solution is buffer oxide etching solution (the composition after configuration is 3wt% HF, 30wt% NH 4 F). The main steps are basically the same as in Example 1, and the difference between the two is only in step 4) and step 5), and step 4) and step 5) in this embodiment are expressed as follows:
[0069] 4)...
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