Moisturizing personal cleansing compositions with improved lipid deposition

A cleansing composition, wet technology, applied in the direction of skin care preparations, cosmetics, cosmetics, etc., can solve the problem of moisturizing agent deposition

Inactive Publication Date: 2001-04-18
THE PROCTER & GAMBLE COMPANY
View PDF41 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Schmidt's patent proposes compositions that depo

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0085] The preparation process involves preparing two premixes, a moisturizer phase premix and a polymer premix, in addition to the main mix. A key step in this method is ensuring that the liquid premix is ​​not over-mixed when added to the main mix.

[0086] Add AE3S and ALS to the main mix tank first. Then add citric acid. Then add the remaining surfactant. Glyceryl trihydroxystearate, lauryl alcohol and all water required, less 10% water for polymer premix. Heat the surfactant mixture to 160°F.

[0087] A polymer premix was prepared in which 10% by weight of the total composition of water was mixed with JR 30M polymer. Mix well. When the ingredients in the main mix tank reached 160°F, the polymer premix was added. Heat the main mix to 190°F.

[0088] Preparation of the moisturizer phase premix begins after the polymer premix is ​​fully added. The master mix preparation was well underway before starting the moisturizer phase premix preparation. Add all oil co...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Viscosityaaaaaaaaaa
Login to view more

Abstract

The present invention relates to moisturizing personal cleansing compositions comprising a lathering surfactant and a lipophilic skin moisturizing agent wherein the moisturizing personal cleansing composition has a Lipid Deposition Value of greater than or equal to about 25 micrograms/square centimeter. The invention further relates to moisturizing personal cleansing composition comprising from about 85% to about 95% of a neat cleansing lotion comprising from about 0.5% to about 30% by weight of the neat cleansing lotion, of a lathering surfactant; from about 0.5% to about 33% by weight of the neat cleansing lotion, of a lipophilic skin moisturizing agent; from about 0.1% to about 2% by weight of the neat cleansing lotion, of a stabilizer; and from about 35% to about 90% by weight of the neat cleansing lotion, of water; and from about 3% to about 15% of a hydrocarbon propellant wherein the moisturizing personal cleansing composition has a Deposition Value of greater than or equal to about 25 micrograms/square centimeter.

Description

technical field [0001] The present invention relates to moisturizing personal cleansing compositions having improved moisturization of the skin. The moisturizing personal cleansing compositions of the present invention comprise a lipophilic skin moisturizing agent, a surfactant, a stabilizer and water, in aerosol form. The compositions of the present invention promote deposition of moisturizers and promote lathering of personal cleansing compositions. These benefits allow the use of personal cleansing compositions without special applicators while maintaining desired lather volume and / or making formulations less expensive without compromising performance. Background of the invention [0002] Moisturizing personal cleansing compositions are gaining popularity in the United States and throughout the world. An ideal moisturizing personal cleansing composition must meet a number of criteria. For example, to be accepted by consumers, moisturizing personal cleansing products mu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/00A61K8/02A61K8/04A61K8/06A61K8/30A61K8/31A61K8/34A61K8/35A61K8/36A61K8/365A61K8/37A61K8/39A61K8/42A61K8/44A61K8/46A61K8/73A61K8/92A61K8/97A61Q1/02A61Q1/14A61Q5/02A61Q19/10
CPCA61K8/046A61K8/466A61K8/361A61K8/37A61K8/365A61K8/342A61K8/463A61Q5/02A61K8/731A61K8/31A61K8/922A61Q19/10A61K8/442
Inventor T·J·狄克森
Owner THE PROCTER & GAMBLE COMPANY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products