Exposure apparatus
An exposure device and mask technology, which is applied in photolithography exposure devices, microlithography exposure equipment, optics, etc., can solve the problems of large errors, time-consuming, difficult to apply, etc.
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[0023] Hereinafter, embodiments of the exposure method of the exposure apparatus according to the present invention will be described with reference to the drawings.
[0024] The present invention is an exposure apparatus that calibrates a substrate having a plurality of calibration marks for positioning, and a mask having mask marks for aligning positions with the calibration marks and a mask provided with a predetermined pattern. Exposure is carried out in a state where it fits on the substrate.
[0025] First, the exposure device will be described.
[0026] In the attached drawings, figure 1 It is a plan view showing main parts of the exposure apparatus. figure 2 It is a three-dimensional schematic diagram of the whole exposure device. image 3 (a) is a schematic diagram showing the arrangement of mask marks on the mask. image 3 (b) is a schematic diagram showing the arrangement of alignment marks on the substrate. Figure 4 A schematic side view of the exposure devic...
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