The invention relates to the field of
photolithography based on computer-to-plate techniques and provides a photolithographic
machine exposure system and a control method thereof. The photolithographic
machine exposure system comprises a
light source, a light path
assembly, a photolithographic lens and a substrate, which are connected in sequence. The light path
assembly modulates the optical
signal emitted by the
light source and then outputs the optical
signal. The photolithographic lens focuses the optical
signal output from the light path
assembly onto the substrate to form a
first light spot. The photolithographic
machine exposure system further comprises an optical device, a controller and an exposure lens assembly, wherein the controller controls the optical device to emit the optical signal from the
light source, and the exposure lens assembly focuses the optical signal emergent from the optical device onto the substrate to form a second
light spot. The
diameter of the second
light spot is larger than that of the
first light spot. The photolithographic machine exposure system adopts the optical device to change the travel direction of the optical signal, adopts the exposure lens assembly to focus the optical
signal on the substrate to form the large
light spot, achieves the effect of rapid exposure of the large clear area without affecting the exposure of the fine pattern, and increase the work efficiency of the photolithographic machine.