43results about How to "Quick exposure" patented technology

Systems and methods of manufacturing ophthalmic lenses, for example, soft, extended wear silicone hydrogel contact lenses, are provided. The systems generally include a housing having an illuminated chamber, a carrier, for example a tray, movable in the illuminated chamber from an inlet portion to an outlet portion of the housing, and the tray configured to carry a plurality of contact lens molds. Polymerizing light energy is provided, for example, by multiple fluorescent lamps, to the molds at an intensity effective to at least initiate polymerization of a monomer composition located in each of the molds. The light may be illuminated onto two opposing sides of each mold. In some cases, the intensity of the light provided to one side of the mold may be different to the light intensity provided to the opposing side of the mold. In addition, the system may include features that are effective to provide for an instantaneous start and an instantaneous end to the light induced cure of the monomer in the molds. The system may include DALI protocol based technology for controlling the fluorescent lamps.

The present invention describes an edible product comprising a core composition comprising a sweetener and a shell or coating composition comprising at least one dietary fiber component, wherein the core composition is at least partially coated or encapsulated by the shell composition, a method of production of such an edible product, and its use.

The invention relates to the field of photolithography based on computer-to-plate techniques and provides a photolithographic machine exposure system and a control method thereof. The photolithographic machine exposure system comprises a light source, a light path assembly, a photolithographic lens and a substrate, which are connected in sequence. The light path assembly modulates the optical signal emitted by the light source and then outputs the optical signal. The photolithographic lens focuses the optical signal output from the light path assembly onto the substrate to form a first light spot. The photolithographic machine exposure system further comprises an optical device, a controller and an exposure lens assembly, wherein the controller controls the optical device to emit the optical signal from the light source, and the exposure lens assembly focuses the optical signal emergent from the optical device onto the substrate to form a second light spot. The diameter of the second light spot is larger than that of the first light spot. The photolithographic machine exposure system adopts the optical device to change the travel direction of the optical signal, adopts the exposure lens assembly to focus the optical signal on the substrate to form the large light spot, achieves the effect of rapid exposure of the large clear area without affecting the exposure of the fine pattern, and increase the work efficiency of the photolithographic machine.

Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0<r<4.0. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and/or switch reticles between exposures.

A multilayer sliding member is provided that contains no lead but has superior friction and abrasion properties under the conditions of high PV values and can be used suitably in dry lubrication environments. The multilayer sliding member includes: a porous metal layer that is formed on a back metal; and a sliding layer that is formed by impregnating and coating the porous metal layer, wherein the sliding layer includes 1 to 25% by volume of an oxybenzoyl polyester resin, 1 to 15% by volume of a phosphate, 1 to 20% by volume of barium sulfate, and polytetrafluoroethylene resin. The oxybenzoyl polyester resin (POB) improves the strength and abrasion resistance of the sliding material, and the synergistic effect of the phosphate and barium sulfate facilitates the transfer of PTFE to a counter material during sliding, so that the coefficient of friction can be decreased and the abrasion resistance can be improved.

An economical X-ray apparatus that allows a rapid exposure of comparatively large-format digital X-ray images has an exposure unit, with which a predetermined surface segment of an exposure plane can be exposed with X-ray radiation, and a digital X-ray detector that is moved in the exposure plane, with the X-ray detector being continuously periodically driven.

A high-speed photographic printer having an imaging active matrix liquid crystal display with a corrective lens arrangement confronting the imaging active matrix liquid crystal display. The high-speed photographic printer includes a light sealable housing, a lens drawer located between the imaging active matrix liquid crystal display, an operating system that perceives RAM as a hard drive, and a light stream having an orange hue that is conventionally provided by a film negative. Image information is provided to the imaging active matrix liquid crystal display. Customer information associated with the image information is imprinted on the photosensitive material adjacent to the image with an optical marker in the light sealable housing. Such imprinted information is sensed down line from the high-speed photographic printer such as at a cutting station.

The invention provides a method and apparatus for quickly positioning reliability weak links of an intelligent electric energy meter. The apparatus comprises a temperature stepping test module, a vibration stepping test module, a temperature cycling test module and an environmental stress test module. The specific method is as follows: 1) performing a temperature stepping test on the intelligent electric energy meter to be tested to determine a temperature weak link of the intelligent electric energy meter; performing a vibration stepping test on the intelligent electric energy meter to be tested to determine a vibration weak link of the intelligent electric energy meter; and 2) performing a temperature cycling test on the intelligent electric energy meter to determine a temperature weak link of the intelligent electric energy meter; and performing an environmental stress test on the intelligent electric energy meter to determine an environment weak link of the intelligent electric energy meter. The weak links of the intelligent electric energy meter are positioned, and the stability of the intelligent electric energy meter is improved.

A method of treating an orally ingestible item having an original taste to be enhanced or reduced without imparting bitterness to the item, includes exposing the item to a magnetic field and oxygen.

The invention discloses a metal grating coupling SPR (Surface Plasmon Resonance) detection chip and a manufacturing method thereof. The detection chip comprises a transparent substrate, a metal grating coupling layer formed on the substrate, and a microfluid layer covered on the metal grating coupling layer. The manufacturing method comprises the following steps: applying a laser hologram photoetching process to form strip gratings on photoresist uniformly coated on the surface of the substrate, forming a metal film by a metal film coating process, further stripping the photoresist to obtain a metal grating coupling layer, and bonding the prepared microfluid layer and the metal grating coupling layer to obtain a target product. According to the invention, the laser hologram photoetching process is applied in the SPR detection chip, and in a grating manufacturing process, rapid and large-area exposure is available to obtain periodic striped patterns, i.e. one-dimensional gratings, so the process time and cost are greatly reduced, which is conductive to industrialized mass production.

The invention relates to a production processing method of a subway train, particularly to a method for constructing a station-system beating type production mode of a subway train, so that technical problems that the application scope of the production line is small, the workers grouped based on skill types for working with high variability, the working management is confused, the production efficiency is low, various management measures can not be done truly, and the traceability is poor in the prior art are solved. The method comprises: standard stations are established, a production line of a whole subway train is cut into separate standard stations, when products flow on the production line, workers completes regulated working contents within one beat, and the workers and delivery men are separated by relative stay areas of the products; the time for completing two same products, two same services, or two same batches of products continuously is determined and thus the beat is determined; and then, with a standard station as a working organization unit, production is organized by assembly line work in a beating type balanced production mode.

A pourer for improving organoleptic properties for various beverages includes a base and a tubular member extending longitudinally through the base. A spout extends outwardly from the tubular member and at least two magnets disposed longitudinally along the tubular member are provided for exposing the beverage to a magnetic field as the beverage passes through the tubular member and spout.

The invention relates to the field of intelligent visual recognition, in particular to an exposure method and system based on scene depth and an electronic device thereof. The exposure method based onthe scene depth includes the following steps: obtaining a depth map of a to-be-exposed scene, and obtaining a mask map by comparing the sizes of depth values of corresponding pixel points in the depth map; calculating the depth values of all pixel points in the depth map corresponding to the mask map to obtain corresponding weight maps; and adjusting the exposure value of the to-be-exposed scenebased on the weight maps. The exposure method based on the scene depth provided by the invention can carry out exposure value adjustment according to the scene requirements, has a small calculation amount, is especially suitable for the field of intelligent containers, and further achieves the exposure adjustment of the characteristic parts of commodities for sale.

The invention discloses a surgical bent visual self-retaining laryngoscope system and a using method thereof. The self-retaining laryngoscope system comprises a self-retaining laryngoscope with a pipe cavity, a camera and an illuminating head which are arranged at the front end of the pipe cavity, image display equipment, an illuminating power supply, a first cable which is connected with the camera and the image display equipment, and a second cable which is connected with the illuminating head and the illuminating power supply, wherein the pipe cavity is of an arc-shaped structure. Since the structure of the self-retaining laryngoscope disclosed by the invention adopts a bending angle close to the geometrical size of a human body throat, the self-retaining laryngoscope can be easily inserted into the throat without using very great external force, human body tissues are not damaged and the surgical bent visual self-retaining laryngoscope system is more compliant with the ergonomic characteristic.

An exposure method for an exposure device has a good integrated accuracy of a substrate and a photomask and a short process time in performing exposure to a substrate rapidly. The invented method uses a substrate integrated with an integration mark and a patterned photomask having a photomask mark, and performs exposure in a state where the photomask is tightly connected to the substrate. The invented method comprises: using the photomask mark as a basis to obtain a point MA where the diagonal lines of half region of the photomask intersect, and a point MB where the diagonal lines of the whole region of the photomask intersect; using the integration mark as a basis to obtain a point WA where the diagonal lines of half of the region of the substrate intersect, and a point WB where the diagonal lines of the whole region of the substrate intersect; performing a comparison process of comparing the MB point of the photomask mark with the WB point of the integration mark; performing a determination process of determining whether the WB point of the integration mark relative to the MB point of the photomask mark is within a tolerance range; and irradiating the exposure light on the whole substrate when the determined result from the determination process falls within the tolerance range.

The invention provides a behavioristics device for testing negative emotion. The behavioristics device comprises a platform, a support frame and an arm body, wherein the platform is used for placing a to-be-tested object; the support is connected with the bottom of the platform; the arm body is arranged around the edge of the platform and is connected with the platform; the height of the arm body is greater than the maximum height of the to-be-tested object; the support frame is of a Y-shaped structure and comprises a first support frame end, a pivoting base, a second support frame end and a third support frame end, wherein one end of the first support frame end is connected with the bottom of the platform; the other end of the first support frame end is connected with the pivoting base; the second support frame end and the third support frame end are pivotally connected with the pivoting base; and an included angle between the second support frame end and the third support frame end is adjusted by rotation of the second support frame end and the third support frame end.

The invention claims an exposure system capable of reducing scan time and scan distance and a control method thereof. Low cost of production may be implemented and exposure accuracy may be improved by using the exposure system and control method thereof. Moreover, rapid exposure of a substrate of exposure regions with different sizes may be implemented. The exposure system has several optic module components used for radiating lights with patterns onto exposure regions that differ from each other. The optic module components are arranged to permit adjustment of space distance there-between. Control method of the exposure system comprises the following steps: determining whether the exposure mode is changed; and adjusting space distance between several optic module components according to the changed exposure mode if it is.

The present technology discloses smart labels to monitor physical parameters, and for traceability and authentication of objects, documents or people. This active and multifunctional label is based on spectrally and spatially multiplexed Quick Response (QR) codes (A). Spectrally selectivity is achieved using luminescent materials and spatially multiplexing is achieved using different patterns (B) combining both to design improved QR codes able to store information at different layers of accessibility. This brings advantages over the actual scenario of QR codes wherein the amount of storage information increases up to three times, adding the capability to sense physical parameters and allow to control the provided information, creating public and restricted access. To access and read the content of each layer, different illumination is used (C) to (E) and is processed using a device or via dedicated applications.