The invention relates to the technical field of optoelectronic devices, in particular to a
laser based on a top surface HR layer and a planar
metal grating and a preparation method, and the
laser comprises a
gain chip, an optical
waveguide, the planar
metal grating and a covering layer, the planar
metal grating prepared by adopting an electronic
evaporation plating process replaces traditional complex three-dimensional
etching, so that the controllable precision and flatness of the grating structure are greatly improved, an InP secondary
epitaxy process is abandoned, the whole process flow is simplified, the production cost is reduced, the product performance consistency and the product yield are improved, and the production cost is reduced. The reflection filtering efficiency is remarkably improved, the purity of the Bragg
reflection spectrum is guaranteed, the narrow linewidth performance of the
laser is achieved, the covering layer covers the plane
metal grating, the problem that
semiconductor secondary epitaxial lattices are not matched is effectively solved,
diffraction light can be restrained,
light energy overflow is reduced, and the freedom degree is increased through the design of the outer cavity structure.