Fabrication method for integrated semiconductor laser

A laser and semiconductor technology, applied in the structure of semiconductor lasers, lasers, optical waveguide semiconductors, etc., can solve the problems of easy oxidation buried grating DFB fabrication, optical catastrophe, high optical power density, etc., to ensure stable high-power operation, The effect of increasing the threshold optical power and improving the side mode suppression ratio

Inactive Publication Date: 2015-11-25
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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Problems solved by technology

[0003] The common methods to achieve single longitudinal mode wavelength stabilization are DFB structure and DBR structure. For GaSb-based materials, the problem of easy oxidation caused by the high aluminum component in the waveguide layer and confinement layer makes the traditional burial method that requires secondary epitaxy. The production of grating DFB is very difficult
GaSb-based DFB uses the ridge waveguide and Bragg grating in the epitaxial layer to complete the refractive index guidance and gain guidance of light. However, in order to ensure the single-mode operation of the laser, the width of the ridge waveguide is on the order of several microns, and its The light output area is small, the optical power den

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  • Fabrication method for integrated semiconductor laser
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  • Fabrication method for integrated semiconductor laser

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[0025] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0026] It should be noted that implementations not shown or described in the accompanying drawings are forms known to those of ordinary skill in the art. Additionally, while illustrations of parameters including particular values ​​may be provided herein, it should be understood that the parameters need not be exactly equal to the corresponding values, but rather may approximate the corresponding values ​​within acceptable error margins or design constraints. In addition, the directional terms mentioned in the following embodiments only refer to the directions of the drawings. Accordingly, the directional terms are used to illustrate and not to limit the invention.

[0027] The invention provides a preparation method of ...

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Abstract

The invention discloses an integrated semiconductor laser of a 2-micrometer single-mode high-power GaSb-based metal grating master oscillator power amplifier and a fabrication method of the integrated semiconductor laser. The semiconductor laser comprises a substrate, an epitaxial structure, a gain amplification region, a master oscillator region, a metal grating region and light limitation grooves, wherein the epitaxial structure is grown on the substrate and comprises an N-type lower contact layer, an N-type lower limitation layer, a lower waveguide layer, an active region, an upper waveguide layer, a P-type upper limitation layer and a P-type upper contact layer from bottom to top, the gain amplification region is arranged at the front part, namely an emergent light part of the semiconductor laser and is of an isosceles trapezoid structure formed by downwards etching the P-type upper contact layer, the master oscillator region is arranged at the rear part of the gain amplification region and is of a ridged waveguide structure formed by downwards etching the P-type upper contact layer and the P-type upper limitation layer, the metal grating region is arranged at the rear part of the master oscillator region and is of a periodic grating structure formed on the surface of the upper waveguide layer, the light limitation grooves are symmetrically arranged at the two sides of ridged waveguide structure, and the light limitation grooves and the ridged waveguide structure are arranged in an inclining manner.

Description

technical field [0001] The invention relates to a mid-infrared semiconductor laser, in particular to a preparation method of a 2μm single-mode high-power GaSb-based metal grating main oscillation power amplifier (MOPA) integrated semiconductor laser. Background technique [0002] The 2-5μm band contains a very important atmospheric window, including the characteristic spectral lines of many gas molecules, which can be widely used in civil projects such as air pollution monitoring and gas detection; and high-power lasers working in this band can be expected to be used in lidar, It can play a better application effect in military projects such as photoelectric countermeasures. Traditional Si-based and GaAs-based materials have relatively wide band gaps and cannot meet the requirements for wavelength. The relatively narrow bandgap of GaSb material has inherent advantages. However, most F-P cavity semiconductor lasers with common structures work in multimode, and spectral broad...

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Application Information

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IPC IPC(8): H01S5/343H01S5/22H01S5/06
Inventor 杨成奥张宇廖永平徐应强牛智川
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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