The utility model discloses a
passivation contact
cell with a selective
polycrystalline silicon layer. A selective
polycrystalline silicon layer
doping technology is adopted in the
cell, doped
polycrystalline silicon layers are arranged in a local area of a polycrystalline
silicon layer at intervals, local grooves are formed in a back
passivation antireflection layer at intervals,
metal grid lines are in contact with the doped polycrystalline
silicon layers only in groove areas and in non-local opening areas, and the
metal grid lines are suspended on an antireflection film layer. And no contact with the doped polycrystalline
silicon layer is formed. As the intrinsic polycrystalline silicon layer does not have a
free carrier absorption phenomenon, parasitic absorption cannot be formed on photons of which the
wavelength is greater than 950nm, and optical loss can be remarkably reduced. The arrangement of the local opening grooves can reduce the absorption of the
metal grid lines to long-wave photons, the
metal grid lines in the non-local opening area and the antireflection film layer can form a
back reflector, the long-wave photons can be reflected back to the silicon substrate more effectively to be absorbed and utilized again, and the
utilization rate of the long-wave photons is improved.