Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Exposure method and system based on scene depth and electronic device thereof

A technology of scene depth and exposure method, which is applied in the field of intelligent visual recognition, can solve problems that are not suitable for special application scenarios, and achieve the effect of reducing computing workload and increasing acquisition efficiency

Inactive Publication Date: 2019-04-26
创新奇智(北京)科技有限公司
View PDF4 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Existing exposure methods are not suitable for the above special application scenarios

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Exposure method and system based on scene depth and electronic device thereof
  • Exposure method and system based on scene depth and electronic device thereof
  • Exposure method and system based on scene depth and electronic device thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] In order to make the object, technical solution and advantages of the present invention clearer, the invention will be further described in detail below in conjunction with the accompanying drawings and implementation examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0039]The first embodiment of the present invention provides an exposure method S10 based on scene depth to solve the situation of exposing objects to be exposed based on scene depth in the field of intelligent visual recognition.

[0040] In the present invention, the depth of scene refers to the clear range before and after the focus. The farther the depth of scene is, the clearer the whole image will be from the distant view to the near view; Blur to make the subject stand out more. The focal point physically refers to the converging point where parallel light rays are refracted by a lens o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the field of intelligent visual recognition, in particular to an exposure method and system based on scene depth and an electronic device thereof. The exposure method based onthe scene depth includes the following steps: obtaining a depth map of a to-be-exposed scene, and obtaining a mask map by comparing the sizes of depth values of corresponding pixel points in the depth map; calculating the depth values of all pixel points in the depth map corresponding to the mask map to obtain corresponding weight maps; and adjusting the exposure value of the to-be-exposed scenebased on the weight maps. The exposure method based on the scene depth provided by the invention can carry out exposure value adjustment according to the scene requirements, has a small calculation amount, is especially suitable for the field of intelligent containers, and further achieves the exposure adjustment of the characteristic parts of commodities for sale.

Description

【Technical field】 [0001] The invention relates to the field of intelligent visual recognition, in particular to a method, system and electronic device for setting an image change area detection threshold. 【Background technique】 [0002] Now the new retail industry is gradually emerging, and unmanned containers have also been widely promoted. At present, the unmanned containers on the market can identify the products displayed on the container through the product pictures. Therefore, it is particularly important to clearly and accurately obtain the product pictures. Whether the exposure is normal during the image acquisition process directly affects the effect of the image; overexposure, the image looks too bright, and underexposure, the image looks too dark, and the exposure value directly affects the accuracy of image recognition. [0003] Existing exposure methods are mainly divided into two schemes: global statistics or local weighted statistics. Global statistics is a ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H04N5/235H04N13/271H04N13/106
CPCH04N23/70
Inventor 张发恩柯政远
Owner 创新奇智(北京)科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products