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Method and apparatus for printing patterns with improved CD uniformity

A technology of uniformity and pattern, which can be used in optomechanical equipment, microlithography exposure equipment, photoengraving process of pattern surface, etc., and can solve problems such as insufficient

Inactive Publication Date: 2006-12-20
MICRONIC LASER SYST AB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The inventors have found that this averaging method is often not sufficient

Method used

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  • Method and apparatus for printing patterns with improved CD uniformity
  • Method and apparatus for printing patterns with improved CD uniformity
  • Method and apparatus for printing patterns with improved CD uniformity

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Embodiment Construction

[0016] The following specific introduction will be described with reference to the accompanying drawings. The preferred embodiments are described to illustrate the invention and not to limit its scope as defined by the claims. Those skilled in the art will recognize various equivalent variations of what is described below.

[0017] The present invention is particularly applicable to wafer exposure for forming electronic devices by projection of a photomask image, and mask blank (mask blank) for manufacturing a mask by projection of a precursor mask. Exposure, as well as wafer exposure and mask blank exposure using image projection from the spatial light modulator. The invention also applies to reticles or SLM images used in other manufacturing of diffractive optical devices, integrated optical devices, thin-film heads, high-density interconnect devices, MEMS devices, PCBs, MCMs, optical security devices (optical security device), video display devices and other similar devic...

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Abstract

An aspect of the present invention includes a method to pattern a workpiece with improved CD uniformity using a partially coherent electromagnetic radiation source. Said method including the actions of: determining, for a plurality of layers in said workpiece, CD uniformity as a function of a number of exposure flashes, determining, for the plurality of layers in said workpiece, the cost of patterning as a function of the number of exposure flashes, and selecting the number of exposure flashes on a layer by layer basis, which gives a predetermined CD uniformity corresponding to a preferred cost. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Description

technical field [0001] The present invention relates to projection imaging, and more particularly to microlithography utilizing image projection from a mask / reticle or at least one spatial light modulator. Background technique [0002] Current demands for high density and high performance associated with very large scale integration in semiconductor devices require submicron features, increased transistor and circuit speeds, and improved reliability. Such demands require forming device features with high precision and uniformity, which necessitates careful process monitoring. [0003] Image projection illuminated by multimode lasers often results in micro-non-uniformity due to coherence of the light source, as well as surface roughness and aberrations along the optical path. The image formed by each mode or quasi-mode gives an image with high contrast speckle. A speckle pattern is a fine-grained random variation of illuminance, varying from mode to mode, from flare to glin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027G02B26/00G03F7/20
CPCG03F7/70625G03F7/70583G03F7/70558G03F7/70491G03F7/706849
Inventor 托布乔恩·桑德斯特罗姆
Owner MICRONIC LASER SYST AB