Substrate carrier

Abstract

The present invention includes a plurality of carrier arms provided close to each other, each of the carrier arms for supporting a substrate and carrying the substrate in the horizontal direction. The plurality of carrier arms are arranged such that carriage paths thereof overlap one on the other in plan view, each of the paths for carrying-in / out the substrate to / from a processing unit or a substrate housing cassette, and each of the plurality of carrier arms is independently movable in the vertical direction and is capable of passing the other in the vertical direction without interfering with each other. According to the present invention, in the carrier including the plurality of carrier arms, the degrees of freedom of the carrier arms are increased to improve the substrate carriage efficiency.

Description

technical field [0001] The invention relates to a substrate conveying device. Background technique [0002] For example, in the photolithography process of the manufacturing process of a semiconductor device, the following processes are continuously performed: a resist coating process of applying a resist solution to a substrate such as a wafer, and a development process of developing the substrate after exposure. Various treatments such as heat treatment for heating and cooling substrates. [0003] The various treatments mentioned above are usually carried out in a coating and developing treatment system. The coating and development processing system includes, for example: a cassette station on which a cassette capable of accommodating a plurality of substrates is placed; and a processing station equipped with various processing units that perform resist coating on the substrates. treatment, development treatment, heat treatment, etc.; and an interface section for loading...

AI Technical Summary

Problems solved by technology

[0005] However, in the substrate transfer apparatus of the above-mentioned prior art, since a plurality of arms are stacked in the vertical direction and the transfer arms are moved in the vertical direction integrally, the operation of each transfer arm is limited by the operation of other transfer arms.

For example, during the operation of one transfer arm and the transfer of the substrate, the direction and height of the other transfer arms are determined, which limits the operating range of the other transfer arms.

Therefore, the degree of freedom of operation of each transfer arm is reduced, so that, for example, the control of determining the operation sequence of the transfer arms in order to efficiently transfer a plurality of substrates in the coating and development processing system becomes complicated.

In addition, there is a limit to improving substrate transfer efficiency.

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