Ultraviolet light block and photocatalytic materials

a technology of ultraviolet light and photocatalysis materials, applied in the field of metal oxide particles, can solve the problems of increasing the risk of exposure to ultraviolet light from natural sun light in parts of the world, and the detrimental effect of ultraviolet light on biological organisms
US20050232878A1Inactive Publication Date: 2005-10-20NANOGRAM
29 Cites 6 Cited by

Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
NANOGRAM
Publication Date
2005-10-20
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

Nanoscale UV absorbing particles are described that have high UV absorption cross sections while being effectively transparent to visible light. These particles can be used to shield individuals from harmful ultraviolet radiation. These particles can also be used in industrial processing especially to produce solid state electronic devices by creating edges of photoresist material with a high aspect ratio. The UV absorbing particles can also be used as photocatalysts that become strong oxidizing agents upon exposure to LV light. Laser pyrolysis provides an efficient method for the production of suitable particles.
Need to check novelty before this filing date? Find Prior Art

Description

CROSS REFERENCE TO RELATED APPLICATIONS

[0001] This application is a divisional of copending U.S. patent application Ser. No. 09 / 566,476 to Kambe et al., entitled “Ultraviolet Light Block And Photocatalytic Materials,” which is a continuation of U.S. Pat. No. 6,099,798 to Kambe et al., entitled “Ultraviolet Light Block And Photocatalytic Materials,” both of which are incorporated herein by reference.FIELD OF THE INVENTION

[0002] The present invention relates to metal oxide particles that are effective at absorbing ultraviolet light for use in UV blocks and photocatalytic materials. The invention further relates to methods for the production of the metal oxide particles. BACKGROUND OF THE INVENTION

[0003] While ultraviolet light can be useful in commercial processing, contact with ultraviolet light has a detrimental effect on biological organisms. Harmful ultraviolet light can come from both sun light and from artificial light sources. The risk from exposure to ultraviolet light from...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More