Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Magnetoresistive effect element, thin-film magnetic head, method for manufacturing magnetoresistive effect element, and method for manufacturing thin-film magnetic head

a technology of magnetoresistive effect and magnetic head, which is applied in the direction of nanomagnetism, data recording, instruments, etc., can solve the problems of inability to improve the the degradation mode becomes a problem, and the under and over layers are inevitably thin, so as to achieve sufficient bias magnetic field, sufficient crystallinity of the end portion of the magnetic domain controlling bias layer, and the effect o

Inactive Publication Date: 2008-02-07
TDK CORPARATION
View PDF4 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0012]The metal layer made of a material having a bcc structure is formed on the magnetic domain controlling bias layer of a material at least partially including an hcp structure and on the MR multilayered structure to contiguously cover the magnetic domain controlling bias layer and the MR multilayered structure. Accordingly, a sufficiently thick metal layer of the material having the bcc structure is present on the end portion of the magnetic domain controlling bias layer near the MR multilayered structure and therefore the crystallinity of that portion of the magnetic domain controlling bias layer can be sufficiently increased. Consequently, the c-axis which is the axis of easy magnetization of the magnetic domain controlling bias layer can be directed to the in-plane direction of the MR multilayered structure to provide a sufficient bias magnetic filed to the magnetization free layer of the MR multilayered structure. Thus, degradation of the MR read head element which would otherwise be caused by a mechanical strain resulting from thermal expansion, a stress by an impact, or magnetostriction can be effectively prevented.
[0021]The first metal layer is formed of a material including a bcc structure on the magnetic domain controlling bias layer at least partially including an hcp structure. The second metal layer is formed of a material having a bcc structure on the first metal layer and the MR multilayered structure to contiguously cover them. Alternatively, the magnetic domain controlling bias layer at least partially including an hcp structure is formed, the first metal layer of a material having a bcc structure is formed on the magnetic domain controlling bias layer, the surface of the first metal layer and the MR multilayered structure is planarized to remove at least a portion of the first metal layer. The second metal layer of a material having a bcc structure is formed on the planarized surface to contiguously cover the first metal layer or the magnetic domain controlling bias layer and the MR multilayered structure. Thus, a sufficiently thick first and / or second metal layer of a material having a bcc structure is present on the end portion of the magnetic domain controlling bias layer that is near the MR multilayered structure and therefore especially the crystallinity of that portion of the magnetic domain controlling bias layer can be sufficiently improved. Consequently, the c-axis which is the axis of easy magnetization of the magnetic domain controlling bias layer can be directed to the in-plane direction of the MR multilayered structure to provide a sufficient bias magnetic field to the free layer of the MR multilayered structure. Thus, degradation of the MR read head element which would otherwise be caused by a mechanical strain resulting from thermal expansion, a stress by impact, or magnetostriction can be effectively prevented.
[0025]The magnetic domain controlling bias layer at least partially including an hcp structure is formed, and the single metal layer is formed of a material having a bcc structure on the magnetic domain controlling bias layer and the MR multilayered structure to cover them. Accordingly, a sufficiently thick metal layer of a material having the bcc is present on the end portion of the magnetic domain controlling bias layer that is near the MR multilayered structure and therefore especially the crystallinity of that portion of the magnetic domain controlling bias layer can be sufficiently improved. Consequently, the c-axis which is the axis of easy magnetization of the magnetic domain controlling bias layer can be directed to the in-plane direction of the MR multilayered structure to provide a sufficient bias magnetic field to the free layer of the MR multilayered structure. Thus, degradation of the MR read head element which would otherwise be caused by a mechanical strain resulting from thermal expansion, a stress by impact, or magnetostriction can be effectively prevented.

Problems solved by technology

A degradation mode becomes a problem of the GMR thin-film magnetic heads and TMR thin-film magnetic heads that is capable of coping with high recording densities, and have the CPP structure.
One cause of the degradation is imperfection of the crystallinity of a magnetic domain controlling bias layer that aligns magnetic domain of a magnetization free layer of TMR read head elements or GMR read head elements with the CPP structure.
However, both of the under and over layers under and over the end portion of the magnetic domain controlling bias layer are inevitably thin for manufacturing process reasons.
Therefore, even if the under and over layers are formed of Cr having a bcc structure, it is prohibitively difficult to improve the crystallinity of the end portion of the magnetic domain controlling bias layer because the end portion, which is of foremost importance, is thin.
Accordingly, it is difficult to prevent variations in the magnetization state caused by mechanical strain, stress, and magnetostriction.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Magnetoresistive effect element, thin-film magnetic head, method for manufacturing magnetoresistive effect element, and method for manufacturing thin-film magnetic head
  • Magnetoresistive effect element, thin-film magnetic head, method for manufacturing magnetoresistive effect element, and method for manufacturing thin-film magnetic head
  • Magnetoresistive effect element, thin-film magnetic head, method for manufacturing magnetoresistive effect element, and method for manufacturing thin-film magnetic head

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043]FIG. 1 is a flowchart illustrating a process for manufacturing a thin-film magnetic head according to an embodiment of the present invention, FIG. 2 is a cross-sectional view schematically showing a configuration of the thin-film magnetic head manufactured according to the embodiment shown in FIG. 1, FIG. 3 is a flowchart illustrating in detail a process for manufacturing a read head element in the manufacturing process shown in FIG. 1, and FIGS. 4a to 4c are cross-sectional views illustrating the manufacturing process shown in FIG. 3. The cross-section shown in FIG. 2 is a plane perpendicular to the ABS and the track-width direction of the thin-film magnetic head, and the cross-sections in FIGS. 4a to 4c are parallel to the ABS of the thin-film magnetic head.

[0044]While the magnetic head manufactured in this embodiment is a TMR thin-film magnetic head, a GMR thin-film magnetic head having the CPP structure can be manufactured as well using basically the same manufacturing pro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A magnetoresistive effect (MR) element, a thin-film magnetic head having the MR element, a method for manufacturing the MR element, and a method for manufacturing the thin-film magnetic head are disclosed. The MR element, which uses electric current in a direction perpendicular to layer planes, includes a lower electrode layer, a MR multilayered structure formed on the lower electrode layer, a magnetic domain controlling bias layer that is disposed on both sides of the MR multilayered structure along the track-width direction and is made of a material at least partially including an hcp structure, a metal layer made of a material having a bcc structure formed on the magnetic domain controlling bias layer and the MR multilayered structure to cover the magnetic domain controlling bias layer and the MR multilayered structure, and an upper electrode layer formed on the metal layer.

Description

PRIORITY CLAIM[0001]This application claims priority from Japanese patent application No. 2006-209580 filed on Aug. 1, 2006, which is incorporated herein by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to a magnetoresistive effect (MR) element, a thin-film magnetic head having the MR element, a method for manufacturing the MR element, and a method for manufacturing a thin-film magnetic head having the MR element.[0004]2. Description of the Related Art[0005]As the recording densities of hard disk drives (HDDs) increase, highly-sensitive and high-resolution thin-film magnetic heads are being demanded. In order to meet the demand, tunnel magnetoresistive effect (TMR) thin-film magnetic heads having a TMR read head element are becoming commercially practical. TMR thin-film magnetic heads has a CPP (Current Perpendicular to Plane) structure in which sense current flows in a direction perpendicular to the film planes or layer plan...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G11B5/127
CPCB82Y10/00B82Y25/00G11B2005/3996G11B5/3909G11B5/3932G11B5/3906
Inventor KAGAMI, TAKEOTANAKA, KOSUKEHARA, SHINJIKANAYA, TAKAYASUMORIZUMI, NOBUYOSHI
Owner TDK CORPARATION
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products