Apparatus and method for cleaning a glass substrate before photoresist coating

Abstract

A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

Description

FIELD OF THE INVENTION[0001]The present invention relates to a method and an apparatus for cleaning a glass substrate, and more particularly, to a method and an apparatus for rinsing oxide compounds and organic residues on the surface of a metal film before a glass substrate is coated with a photoresist.BACKGROUND OF THE INVENTION[0002]With rapid advancement of the fabrication technology of thin film transistor liquid crystal displays (TFT-LCDs), the LCD is largely applied in various electronic products such as a Personal Digital Assistant (PDA) device, a notebook computer, a digital camera, a video camera, and a mobile phone due to the fact it has advantages of smaller size, lighter weight, lower power consumption and low radiation. Moreover, since manufacturers aggressively invest in research & development and employ large-scale fabricating equipment, the quality of the LCD is unceasingly improved and the price thereof is continuously decreased. That promptly broadens the applied ...

AI Technical Summary

Benefits of technology

[0007]The primary objective of the present invention is to provide a method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate so as to prevent the coated photoresist patterns from resulting in defects, disconnections and peelings.

[0008]The second objective of the present invention is to provide an apparatus for cleaning a glass substrate before photoresist coating, which apparatus can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate so as to prevent the coated photoresist patterns from resulting in defects, disconnections and peelings.

Problems solved by technology

Moreover, since manufacturers aggressively invest in research & development and employ large-scale fabricating equipment, the quality of the LCD is unceasingly improved and the price thereof is continuously decreased.

Furthermore, the organic residuals also reduce the adhesion of the photoresist to result in peeling.

However, the conventional scrubber and the cleaning method thereof cannot remove the organics and oxides on the surface of the metal film of the glass substrate and the formed photoresist patterns still have defects, disconnections and peelings.

Images