Evacuation apparatus

a technology of evacuating apparatus and auxiliary components, which is applied in the direction of machines/engines, liquid fuel engines, positive displacement liquid engines, etc., can solve the problems of large volume of evacuating, increased power consumption, and operation failur

a technology of evacuating apparatus and auxiliary components, which is applied in the direction of machines/engines, liquid fuel engines, positive displacement liquid engines, etc., can solve the problems of large volume of evacuating, increased power consumption, and operation failur

US20100209259A1Inactive Publication Date: 2010-08-19EBARA CORP
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  • Evacuation apparatus
  • Evacuation apparatus
  • Evacuation apparatus

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Embodiment Construction

[0022]An evacuation apparatus according to an embodiment of the present invention will be described below with reference to the drawings.

[0023]FIG. 1 is a side view showing an evacuation apparatus according to the embodiment of the present invention. FIG. 2 is a cross-sectional view showing a first vacuum pump shown in FIG. 1. FIGS. 3A through 3D are schematic views illustrating the manner in which a gas is delivered.

[0024]As shown in FIG. 1, the evacuation apparatus comprises a first vacuum pump 1 serving as a booster pump, a second vacuum pump 2 serving as a main pump, and a housing (an enclosure) 3 for accommodating the first vacuum pump 1 and the second vacuum pump 2 therein. The housing 3 is fixed to an upper surface of a bottom plate 4, and the second vacuum pump 2 is installed on this bottom plate 4. Four wheels 5 (two of which are shown in FIG. 1) are fixed to a lower portion of the bottom plate 4, thus allowing the evacuation apparatus to be transportable.

[0025]The first va...

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Abstract

The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus for processing a substrate such as a semiconductor wafer or liquid crystal panel. An evacuation apparatus according to the present invention includes a first vacuum pump connected to a vacuum chamber, and a second vacuum pump connected to the first vacuum pump. The first vacuum pump has a pair of multistage pump rotors.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a division of U.S. application Ser. No. 10 / 563,255, filed on Jun. 9, 2006, which is a 371 of International Application No. PCT / JP2004 / 015563 filed on Oct. 14, 2004, which is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2003-358424, filed on Oct. 17, 2003, the entire contents of which are incorporated herein by reference.TECHNICAL FIELD[0002]The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus.BACKGROUND ART[0003]An evacuation apparatus is widely used for evacuating a process gas that has been supplied to a vacuum chamber of a substrate processing apparatus. In this substrate processing apparatus such as a CVD apparatus or an etching apparatus, it is required to evacuate the process gas from the vacuum chamber to produce a constant vacuum state therein, and a plurality of vacuum pumps connected in seri...

Claims

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Application Information

Patent Timeline
19 Aug 2010
Publication
US20100209259A1
IPC
F04C14/02; F04C11/00; C23C16/44; F04B49/06; F04C18/00; F04C18/12; F04C18/16; F04C21/00; F04C23/00; F04C25/02; F04C28/02; F04C28/08; F04C29/00
CPC
C23C16/4412; F04C18/126; F04C18/16; F04C23/001; F01C21/007; F04C25/02; F04C28/08; H01J37/32834
Inventors
KAWAMURA, TAKESHI; KAGAWA, KOICHI