Plant for fluorine production and a process using it

Abstract

A fluorine gas manufacturing plant wherein F₂ is manufactured by the electrolysis of KF/HF compositions. The plant comprises skid modules for: HF storage, the electrolytic cells, storage and purification of the manufactured F₂ raw gas, for fluorine gas delivery including a single buffer tank or multiple storage units, scrubbers to provide purified waste gas, for providing cooling water circuits, analysis, electrical rectifiers, an electrical sub-station with transformers and emergency supply, and for utilities including a control room with laboratory and a rest room for the personnel. The advantage of the skids is that they can be separately manufactured in workshops, tested, transported to the facility and assembled there. A great advantage is the safety aspect, a reliable F₂ production for 24 hours and 7 days a week of high purity F₂.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The present application is a U.S. national stage entry under 35 U.S.C. §371 of International Application No. PCT / EP2011 / 065773 filed Sep. 12, 2011, which claims priority to U.S. provisional patent applications No. 61 / 383,204 filed Sep. 15, 2010 and N° 61 / 383,533 filed Sep. 16, 2010, the whole content of each of these applications being incorporated herein by reference for all purposes.TECHNICAL FIELD OF THE INVENTION[0002]The present application concerns a plant for fluorine production in the form of assembled skids and a process wherein it is applied.BACKGROUND[0003]During the manufacture of semiconductors, photovoltaic cells, thin film transistor (TFT) liquid crystal displays, and micro-electromechanical systems (MEMS), often consecutive steps of deposition of material and etching of the respective items are performed in suitable chambers; these processes are often plasma-assisted. During the deposition step, deposits are often not only...

AI Technical Summary

Benefits of technology

[0006]The present invention provides an improved plant suitable to produce fluorine on-site especially for the use as etchant and chamber cleaning agent in the manufacture of semiconductors, photovoltaic cells, thin film transistor liquid crystal displays and micro-electromechanical systems.

Problems solved by technology

There are still problems to be solved in connection with the apparatus used in the on-site concept, for example, the destruction of greater amounts of pure fluorine (F2) and of HF in case of leakages, or the breakdown of equipment.

Images