Direct Focusing with Image Binning in Metrology Tools

a metrology tool and direct focus technology, applied in the field of metals, can solve the problems of complex and essential metal measurement results

Active Publication Date: 2019-07-04
KLA CORP
View PDF10 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent describes a method for capturing images of multiple layers in a target and calculating focus position based on these layers. The technical effect of this invention is to provide a more precise and accurate way to capture and focus on multiple layers in an imaging target.

Problems solved by technology

Metrology measurements are complex and essential in efficient photolithography production.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Direct Focusing with Image Binning in Metrology Tools
  • Direct Focusing with Image Binning in Metrology Tools
  • Direct Focusing with Image Binning in Metrology Tools

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018]In the following description, various aspects of the present invention are described. For purposes of explanation, specific configurations and details are set forth in order to provide a thorough understanding of the present invention. However, it will also be apparent to one skilled in the art that the present invention may be practiced without the specific details presented herein. Furthermore, well known features may have been omitted or simplified in order not to obscure the present invention. With specific reference to the drawings, it is stressed that the particulars shown are by way of example and for purposes of illustrative discussion of the present invention only, and are presented in the cause of providing what is believed to be the most useful and readily understood description of the principles and conceptual aspects of the invention. In this regard, no attempt is made to show structural details of the invention in more detail than is necessary for a fundamental u...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
timeaaaaaaaaaa
areaaaaaaaaaaa
Linnik microscopeaaaaaaaaaa
Login to View More

Abstract

Focusing methods and modules are provided for metrology tools and systems. Methods comprise capturing image(s) of at least two layers of a ROI in an imaging target, binning the captured image(s), deriving a focus shift from the binned captured image(s) by comparing the layers, and calculating a focus position from the derived focus shift. Disclosed methods are direct, may be carried out in parallel to a part of the overlay measurement process and provide fast and simple focus measurements that improve metrology performance.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application claims the benefit of U.S. Provisional Patent Application No. 62 / 400,966 filed on Sep. 28, 2016, which is incorporated herein by reference in its entirety.BACKGROUND OF THE INVENTION1. Technical Field[0002]The present invention relates to the field of metrology, and more particularly, to focusing processes in metrology tools.2. Discussion of Related Art[0003]Metrology measurements are complex and essential in efficient photolithography production. Optimal focus is a prerequisite for accurate measurements, and various system designs provide focus measurements. For example, U.S. Pat. Nos. 4,931,603, 4,672,188 and 6,781,103, which are incorporated herein by reference in its entirety, disclose various methods of focus measurements in metrology systems.[0004]Typical prior art focus procedures include scanning the full range of the focus (˜10 μm in the case of semiconductor metrology tools); at each focus position grabbing and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & AuthorityApplications(United States)
IPC IPC(8): H04N5/232G03F7/20G02B21/00G02B21/24
CPCH04N5/23212G03F7/70641G02B21/0016G02B21/244G02B21/36G03B13/36G03F7/20G02B21/245H04N23/67
InventorGUTMAN, NADAVGOLOVANEVSKY, BORISGLUZER, NOAM
OwnerKLA CORP