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Preparation method of feather dress fabric or slopwork productions with nanometer self-cleaning function

A down jacket fabric, nanometer self-cleaning technology, applied in the field of garment fabric processing, can solve the problems of easy adsorption of dust and impurities, large water consumption, environmental pollution, etc., and achieve significant social and economic benefits and increase service life.

Inactive Publication Date: 2007-08-29
ZHONGKE BOSIDENG NANOMETER CLOTHING ORNAMENT SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Down jacket fabrics are mostly made of nylon fiber, polyester fiber, polyester and cotton blended fabrics. Due to the influence of their own components, the fabric often has relatively serious electrostatic adsorption, which makes the fabric easy to absorb dust and impurities. Although the liner down jacket only needs to be washed However, the quilted down jacket needs to be washed frequently. Frequent washing of the down as a thermal insulation material will damage the oily protective layer on the surface, making the down lose its fluffiness, which seriously affects the warmth retention and appearance of the down jacket.
This will affect the thermal performance
At the same time, due to the large surface area and strong water absorption of down feathers, the cleaning of detergent during the washing process will lead to a large amount of water, pollute the environment, and cause a great waste of energy and resources.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Preparation method of feather dress fabric or slopwork productions with nanometer self-cleaning function
  • Preparation method of feather dress fabric or slopwork productions with nanometer self-cleaning function
  • Preparation method of feather dress fabric or slopwork productions with nanometer self-cleaning function

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Embodiment 1: pure polyester fabric treatment

[0029] The pure polyester fabric is treated with a current of 20A and treated with a low-temperature plasma at a cloth speed of 5 minutes, and then sprayed with a working fluid. The working fluid consists of 0.3wt% titanium oxide with an average particle size of 20nm, Diethoxysilane compound (wherein n=16) 1wt% ethanol solution, the bath ratio is 1:60, spray at room temperature to make the liquid-carrying rate 80%, put it into an oven, and pre-bake it at 40°C for 15 minutes , to obtain a polyester fabric with self-cleaning function.

Embodiment 2

[0030] Embodiment 2: the processing of nylon fabric

[0031] The pure nylon fabric is treated with a current of 30A and treated with a low-temperature plasma at a cloth speed of 3 minutes, and then it is sprayed with a working fluid. Diethoxysilane compound (wherein n = 16) 2wt% ethanol solution, the bath ratio is 1:60, spray at room temperature to make the liquid-carrying rate 80%, put it into an oven, and dry it at 30°C for 30 minutes , to obtain nylon fabric with self-cleaning function.

Embodiment 3

[0032] Embodiment 3: the processing of polyester / cotton blended fabric

[0033] The polyester / cotton blended fabric (polyester / cotton, 60 / 40) is treated with a current of 5A at room temperature and treated with a low-temperature plasma at a cloth speed of 30 minutes, and then sprayed with a working fluid. The composition of the working fluid is 2.5wt% of zinc oxide with an average particle diameter of 50nm, 2.5wt% ethanol solution of fluorine-containing alkyl diethoxysilane compound (n=18) sprays the fabric after the above-mentioned low-temperature plasma treatment, and then dries naturally at room temperature , to obtain polyester / cotton blended fabric with self-cleaning function.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

A self-clean cloth with nanometer technology for feather garment and its preparing method which includes the following steps: construct concave convex nanophase structure on chemical fiber surface to increase microcosmic specific area by physical and chemical modification, graft active group on fiber surface, increase more nanophase solid grain to endow the cloth with high roughness factor so that hydrophobic and oleophobic capability of cloth was enhanced.

Description

technical field [0001] The invention belongs to the field of clothing fabric processing, and relates to a preparation method of nanometer self-cleaning down jacket fabric or ready-made clothing products containing nanotechnology. Background technique [0002] As cold-proof clothing, down jacket has the characteristics of softness, elasticity, cleanness and ease, dryness and warmth. It is an ideal clothing for people to protect against cold in winter. With the improvement of people's living standards, down garments and down products will be in short supply in the market. [0003] The advantages of light, soft and warm down jackets are deeply loved by consumers, but how to clean down jackets is a headache for many people. Down jacket fabrics are mostly made of nylon fiber, polyester fiber, polyester and cotton blended fabrics. Due to the influence of their own components, the fabric often has relatively serious electrostatic adsorption, which makes the fabric easy to absorb d...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): D06M10/00D06M13/50
Inventor 高德康刘必前
Owner ZHONGKE BOSIDENG NANOMETER CLOTHING ORNAMENT SUZHOU
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