Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Self-cleaning suiting containing nano-functional material and method for making garment products

A nano-functional, self-cleaning technology, applied in the field of clothing fabric processing, can solve the problems of detergent energy and resource waste, time-consuming and troublesome, etc., and achieve the effect of increasing service life and significant social and economic benefits

Inactive Publication Date: 2006-08-30
中科纳米技术工程中心有限公司
View PDF4 Cites 35 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The usual practice is to send suits to professional clothing dry cleaners for washing, but this is time-consuming and troublesome; regardless of the washing method of dry cleaning or water washing, it will have the impact of detergent on the environment and a great waste of energy and resources

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-cleaning suiting containing nano-functional material and method for making garment products
  • Self-cleaning suiting containing nano-functional material and method for making garment products
  • Self-cleaning suiting containing nano-functional material and method for making garment products

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Embodiment 1: the padding treatment of pure wool fabric

[0035] Put the pure wool fabric into the working fluid after the treatment current is 10A, the cloth speed is 15 m / min, and the surface treatment is carried out by low-temperature plasma. Triethoxysilane compound (wherein n=2) 1wt% ethanol solution, the bath ratio is 1:60, dipped at 20 ℃ for 1 minute, then squeezed out to make the liquid squeezed rate 80%, put it into the oven, and put it into the oven at 50 Pre-bake for 10 minutes at ℃, and continue to bake at 80℃ for 1.5 minutes to obtain nanometer self-cleaning pure wool fabric. The fabric (100% pure Australian wool) is used to make suits.

Embodiment 2

[0036] Embodiment 2: the padding treatment of wool polyester fabric

[0037] Put the wool polyester fabric (60% Australian wool, 40% polyester) into the working solution after the treatment current is 10A, the cloth speed is 15 m / min, and the surface is treated with low-temperature plasma. Silicon oxide 0.2wt%, fluorine-containing alkyl triethoxysilane compound (wherein n=6) 1.2%, bath ratio is 1:60, dipped at 20 ℃ for 1 minute, then squeezed out to make the squeezed out rate 80% , put it into an oven, pre-bake at 50°C for 10 minutes, and continue to bake at 70°C for 1.5 minutes to obtain a nanometer self-cleaning wool-polyester fabric.

Embodiment 3

[0038] Embodiment 3: the spray treatment of pure wool fabric

[0039] After the Australian wool fabric is subjected to low-temperature plasma surface treatment at room temperature, with a treatment current of 20A and a cloth speed of 10 m / min, a working fluid is used, which consists of 1.5 wt% zinc oxide with an average particle size of 50 nm, fluorine-containing alkyl Triethoxysilane compound (wherein n=8) 2wt% ethanol solution sprays the fabric after the above-mentioned air low-temperature plasma treatment, then puts into the oven, pre-baked at 40°C for 10 minutes, and continued to bake at 80°C for 1 minute , to get the nano wool self-cleaning fabric.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention relates to nm functional material self-cleaning suit face fabric that adopts low temperature plasma surface process technology to take dipping or spraying process with halothane residue triethoxy silicane compound containing nm level solid particle to pure wool or wool terylene blending face fabric to make the face fabric has super water discharging and oil discharging feature to achieve the purpose of self-cleaning. The invention could make the face fabric more handsome and prolong useful life, and it also has great social and economic benefits in environment and energy saving aspects.

Description

technical field [0001] The invention belongs to the field of garment fabric processing, and relates to a self-cleaning suit fabric containing nanometer functional materials, and garments prepared from nanometer self-cleaning pure wool or wool-polyester blended fabric. Background technique [0002] As business and formal social clothing, suits are widely used in modern important social occasions and as casual clothes because of their exquisite fabrics, comfortable wearing and various styles. Most suits are made of pure wool or wool-polyester blended fabrics. Due to the influence of their own components, the fabrics often have relatively serious electrostatic adsorption, which makes the fabrics easy to absorb dust and impurities. Therefore, the fabrics need to be washed frequently. In order to keep the fabric clean, crisp and flat, a complex process of washing and ironing is required. The usual practice is to send suits to professional clothing dry cleaners for washing, but t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): D06M10/00D06M13/50
Inventor 江雷李兰冀旭刘岩郑浩伟
Owner 中科纳米技术工程中心有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products