Light emitting device and method for manufacturing the same
A technology of light-emitting elements and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, electrical components, semiconductor devices, etc., and can solve problems such as difficult control of light emission
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no. 1 approach
[0018] FIG. 1 is a cross-sectional view showing a light emitting element 10 according to a first embodiment of the present invention. FIG. 2 is a plan view of the light emitting element 10 . The light emitting element 10 is made of Si substrate 1, β-FeSi 2 membrane 2, lower electrode 3 and upper electrode 4. β-FeSi 2 The film 2 and the upper electrode 4 are provided on the front side of the substrate 1 . The lower electrode 3 is provided on the back side of the substrate 1 . The lower electrode 3 and the upper electrode 4 sandwich the substrate 1 and β-FeSi 2 film2.
[0019] The Si substrate 1 is an n-type Si (111) substrate manufactured by the Czochraski (CZ: Czochraski) method, that is, a substrate having a main surface with a plane orientation of (111). The size of the substrate is 2 inches. The substrate 1 has a surface 1A and a back surface 1B on opposite sides.
[0020] β-FeSi 2 Film 2 is provided on Si substrate 1 so as to cover surface 1A of Si substrate 1 . ...
no. 2 approach
[0033] Next, a second embodiment of the present invention will be described. The inventors found that if β-FeSi 2 annealing of the film, the β-FeSi 2 The conductivity type of the membrane changes from p-type to n-type. In this embodiment, the change of this conductivity type is used to fabricate n-type β-FeSi on a p-type Si substrate. 2 Light-emitting elements of the film.
[0034] The light emitting element 20 of this embodiment has the structure shown in FIG. 1 similarly to the first embodiment. However, the type and conductivity type of substrate 1 are different from those of β-FeSi 2 The conductivity type of the film 2 is different from that of the first embodiment.
[0035] The Si substrate 1 is a p-type Si(111) substrate produced by the floating zone (FZ) method. The size of the substrate is 2 inches.
[0036] β-FeSi 2 The conductivity type of the film 2 is n-type, which is different from that of the Si substrate 1 . β-FeSi 2 The film 2 is provided on the Si su...
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