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Substrate processing apparatus and processing method

A technology of a substrate processing device and a substrate processing method, which can be applied to static indicators and other directions, can solve problems such as large demand for processing liquid, and achieve the effects of reducing demand and reducing the amount of introduction.

Inactive Publication Date: 2008-06-25
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Claims
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Problems solved by technology

[0005] In order to overcome the disadvantage that the substrate processing device has a large demand for processing liquid in the substrate processing process of the prior art, the present invention provides a substrate processing device that can reuse the substrate processing liquid among multiple devices and a method for processing substrates using the substrate processing device. method

Method used

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  • Substrate processing apparatus and processing method
  • Substrate processing apparatus and processing method
  • Substrate processing apparatus and processing method

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Embodiment Construction

[0012] see figure 2 , is a schematic diagram of the substrate processing apparatus of the present invention. The processing device includes a cleaning device 20 , a developing device 40 and a processing liquid recovery system 30 .

[0013] The cleaning device 20 is used to clean the substrate, and the developing device 40 is used to develop and then clean the exposed substrate.

[0014] The function of the processing liquid recovery system 30 is to introduce the processing liquid discharged from the cleaning device 20 into the developing device 40 to realize the recycling of the processing liquid. The treatment liquid recovery system 30 includes a receiving pipeline 31 , a receiving container 32 and a delivery pipeline 33 . One end of the receiving pipeline 31 is connected to the cleaning device 20 , and the other end is connected to the receiving container 32 ; one end of the outlet pipeline 33 is connected to the receiving container 32 , and the other end is connected to ...

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Abstract

The substrate processing apparatus of the present invention includes one washing device to treat substrate with treating liquid, one developing device and one treating liquid recovering system. The developing device includes one developing part, one pre-cleaning part, one cleaning part, and one post-cleaning part. The treating liquid recovering system set between the washing device and the developing device leads the treating liquid the washing device exhausts to the developing device for reuse. The present invention provides also the method of processing substrate with the substrate processing apparatus.

Description

【Technical field】 [0001] The invention relates to a substrate processing device, and also to a method for processing a substrate using the substrate processing device. 【Background technique】 [0002] In the liquid crystal display manufacturing process, the optical process of the glass substrate consists of several processes: substrate cleaning, photoresist coating, exposure and development. As the area of ​​the glass substrate increases, the water consumption of each process also increases. Therefore, substrate processing The device, especially the cleaning equipment and developing equipment, began to be introduced into the treatment liquid recovery system. [0003] For a prior art, please refer to the substrate processing apparatus disclosed in US Patent Application Publication No. 20030034056. The substrate processing apparatus is a cleaning apparatus having a substrate processing section for processing a substrate with a processing liquid, and a processing liquid circula...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/133
Inventor 詹育颖王敬龙许文诚曾增魁邓振坤谢和利
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
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