Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Optical parameter chirp impulse amplification laser system

A technology of chirped pulses and laser systems, which is applied in the field of laser systems, can solve the problems of large influence on the optical path, limited output power constraints, and difficult precise control, and achieve the effects of convenient tuning and low conversion efficiency

Inactive Publication Date: 2009-01-14
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the femtosecond pulse pumping non-collinear OPA process in the BBO crystal is used in the amplifier stage to amplify the signal pulse, which requires high synchronization accuracy of the system, and the output power of the system is affected by the signal pulse width and the pump pulse Energy constraints are also quite limited
In addition, the tuning of the wavelength is realized by rotating the crystal angle, which has a great influence on the optical path behind, and it is not easy to control precisely

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical parameter chirp impulse amplification laser system
  • Optical parameter chirp impulse amplification laser system
  • Optical parameter chirp impulse amplification laser system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be further described below in conjunction with the embodiments and accompanying drawings.

[0025] see first figure 2 , figure 2 The structure schematic diagram of the optical parametric chirped pulse amplification laser system of the present invention. It can be seen from the figure that the optical parametric chirped pulse amplification laser system of the present invention is composed of a Ti:Sapphire femtosecond mode-locked pulse oscillator 15, a first beam splitter 16, a CEP stable signal pulse source 21, an OPCPA synchronous pump source 24, and an OPCPA amplified Stage 30 and compressor 32 are made up of, and its position relation is as follows: the output beam direction of this titanium sapphire femtosecond mode-locked pulse oscillator 15 is the first beam splitter 16, and the first beam splitter 16 divides the laser beam into transmission beams and reflected light beam, in the direction of the transmitted light beam, the CEP stable...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A optical parameter chirp pulse amplification laser system, includes a titanium gem femtosecond mode-locking pulse oscillator, a first splitting film, a CEP steady signal pulse source, an OPCPA synchronous pumping source, an OPCPA amplifier stage and compressor. In the output beam direction of the titanium gem femtosecond mode-locking pulse oscillator is the first splitting film, which divides a laser beam into a transmission light beam and a reflection light beam, and in the said transmission light beam is said CEP steady signal pulse source, OPCPA amplifier stage and compressor in order. The said CEP steady signal pulse source comprises a photonic crystal optical fiber, a chirp mirror, a period polarization lithium niobate crystal and a stretcher; said OPCPA amplifier stage comprises a first two-tone mirror, a first nonlinear crystal, a second two-tone mirror and a second nonlinear crystal; said OPCPA synchronous pumping source comprises a Q-tuning frequency-multiplier YAG laser, a narrowband titanium gem regenerating amplifier and a second splitting film, and a holophote. The invention apparatus may get a near-infrared ultrashort laser pulse output with a pulse width less than 30 femtoseconds.

Description

technical field [0001] The invention relates to a laser system, in particular to a carrier envelope phase (hereinafter referred to as CEP) stable optical parametric chirped pulse amplification (hereinafter referred to as OPCPA) laser system in the near-infrared band. Background technique [0002] In recent years, ultrashort pulse laser technology has developed rapidly. The continuous improvement of chirped pulse amplification (hereinafter referred to as CPA) technology and OPCPA technology has continuously narrowed the pulse width of ultrashort laser pulses. The output of ultra-short ultra-intense pulse. At present, research on ultrashort pulse systems is mainly limited to 800nm ​​and 1064nm bands. Obtaining ultrashort pulses in the near-infrared band is of great significance in applications such as the generation of high-order harmonics in inert gases and ultra-high-speed optical communications. [0003] The carrier envelope phase (CEP for short) of ultrashort pulses is d...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01S3/00G02F1/35
Inventor 姜永亮冷雨欣陈晓伟李小芳徐至展
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com