84results about How to "Raise the overpotential" patented technology

Electrochemical devices for converting carbon dioxide to useful reaction products include a solid or a liquid with a specific pH and / or water content. Chemical processes using the devices are also disclosed, including processes to produce CO, HCO−, H2CO, (HCO2)−, H2CO2, CH3OH, CH4, C2H4, CH3CH2OH, CH3COO−, CH3COOH, C2H6, (COOH)2, (COO−)2, acrylic acid, diphenyl carbonate, other carbonates, other organic acids and synthetic fuels. The electrochemical device can be a CO2 sensor.

Electrocatalysts for carbon dioxide conversion include at least one catalytically active element with a particle size above 0.6 nm. The electrocatalysts can also include a Helper Catalyst. The catalysts can be used to increase the rate, modify the selectivity or lower the overpotential of electrochemical conversion of CO2. Chemical processes and devices using the catalysts also include processes to produce CO, HCO−, H2CO, (HCO2)−, H2CO2, CH3OH, CH4, C2H4, CH3CH2OH, CH3COO−, CH3COOH, C2H6, (COOH)2, or (COO−)2, and a specific device, namely, a CO2 sensor.

Catalysts that include at least one catalytically active element and one helper catalyst can be used to increase the rate or lower the overpotential of chemical reactions. The helper catalyst can simultaneously act as a director molecule, suppressing undesired reactions and thus increasing selectivity toward the desired reaction. These catalysts can be useful for a variety of chemical reactions including, in particular, the electrochemical conversion of CO2 or formic acid. The catalysts can also suppress H2 evolution, permitting electrochemical cell operation at potentials below RHE. Chemical processes and devices using the catalysts are also disclosed, including processes to produce CO, OH−, HCO−, H2CO, (HCO2)−, H2CO2, CH3OH, CH4, C2H4, CH3CH2OH, CH3COO−, CH3COOH, C2H6, O2, H2, (COOH)2, or (COO−)2, and a specific device, namely, a CO2 sensor.

An electrocatalytic device for carbon dioxide conversion includes an electrochemical stack comprising a series of cells with a cathode with a Catalytically Active Element metal in the form of supported or unsupported particles or flakes with an average size between 0.6 nm and 100 nm. The reaction products comprise at least one of CO, HCO−, H2CO, (HCOO)−, HCOOH, CH3OH, CH4, C2H4, CH3CH2OH, CH3COO−, CH3COOH, C2H6, (COOH)2, (COO−)2, and CF3COOH.

The invention discloses a preparation method of a high-hardness Cu-SiC nanometer compound plating layer and a special device thereof. The preparation method comprises the following steps of: pretreating nanometer SiC particles, preparing an electrolytic solution containing the nanometer SiC particles, primarily treating a cathode plate and carrying out electrolytic deposition for preparing the high hardness Cu-SiC nanometer compound plating layer. In the preparation method of a high-hardness Cu-SiC nanometer compound plating layer, secondary reunion of the nanometer particles can be effectively avoided, the electrolytic solution spray deposition process can be higher than the cathode current density of the common electrodeposition processes for carrying out electrolytic deposition, and therefore, high speed electrolytic deposition on unit area of the cathode surface can be realized. The nanometer composite plate prepared by the invention has the advantages of high content of nanometerparticles, uniform distribution of nanometer particles, high hardness, compact crystal structure, good surface quality, and the like.