Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Additives for recycling copper

An additive and copper recovery technology, applied in the improvement of process efficiency, photographic technology, instruments, etc., can solve the problems of copper product form and quality decline, and achieve the effects of increasing polarization, increasing overpotential, and high purity

Active Publication Date: 2018-03-02
SHENZHEN JECH TECH +1
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides an additive for recovering copper, aiming to solve the problem that the shape and quality of copper products recovered by the existing recovery method are reduced

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Additives for recycling copper
  • Additives for recycling copper
  • Additives for recycling copper

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Add additives containing 1,2-ethylenethiourea 10ppm, benzylated polyethyleneimine 20ppm and methylene naphthalene disulfonate 15ppm to a copper ion concentration of 45g / L and a chloride ion concentration of 190g / L , pH = 9 etching solution, and electrolysis with a current density of 250A / m2 for 24 hours.

Embodiment 3

[0024] Get the additive that comprises thiazolinone polydithiopropane sulfonate sodium 20ppm, dimethyldiallyl ammonium chloride 10ppm and hexadecane-betaine 5ppm to add to copper ion concentration and be 45g / L, and chloride ion concentration is 190g / L, pH = 9 etching solution, and electrolysis with a current density of 250A / m2 for 24 hours.

[0025] Example 3

[0026] An additive comprising 20 ppm of dithiobiuret, 10 ppm of triazine amide and 5 ppm of propylene glycol block polyether was added to an etching solution with a copper ion concentration of 45 g / L, a chloride ion concentration of 190 g / L, and a pH=9, And electrolysis for 24 hours with a current density of 250A / m2.

Embodiment 4

[0028] Get the additive that comprises 1,2-ethylenethiourea 10ppm, dithiobiuret 10ppm, dimethyldiallyl ammonium chloride 15ppm and methylene naphthalene disulfonate 10ppm and join to copper ion concentration of 45g / L, chloride ion concentration of 190g / L, pH = 9 etching solution, and electrolysis at a current density of 250A / m2 for 24 hours.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides additives for recycling copper, and relates to the technical field of material preparation. The additives comprise 10-50 ppm of a brightener, 10-30 ppm of a leveling agent and 5-20 ppm of a surface active agent. By adding the additives including the brightener, the leveling agent and the surface active agent in etching liquid, the overpotential is improved, polarization is increased, the electrode reaction speed is reduced, and a fine-grain and bright copper clad layer is finally obtained. Therefore, a copper layer with a bright and flat surface, high purity, a compact structure and ductility is obtained through recycling.

Description

technical field [0001] The invention belongs to the technical field of material preparation, and in particular relates to an additive for recovering copper. Background technique [0002] Alkaline etchant is a chemical widely used in the production process of printed circuit board (PCB). Utilizing alkaline etching solution can produce an alkaline etching waste solution containing high concentration copper. In order to save resources, the copper in the waste liquid is generally regenerated and recycled. [0003] At present, there are two methods for regeneration and circulation treatment of alkaline etching solution. One is the extraction method, which uses the difference in the distribution ratio of copper ions in the extraction agent and the etching waste liquid, and mixes the extraction agent with the etching waste liquid to transfer the copper ions in the etching waste liquid into the extraction agent, and back-extract with sulfuric acid solution. Obtain copper sulfate ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C25C1/12C25C7/06
CPCC25C1/12C25C7/06Y02P10/20
Inventor 李建光崔磊张良卢江峰刘智凯
Owner SHENZHEN JECH TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com