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Control system, lithographic apparatus, device manufacturing method and device manufactured thereby

一种控制系统、控制器的技术，应用在控制系统领域，能够解决限制、系统移动速度和精确度施加等问题，达到精确度和速度提高、少相位延迟、高总性能的效果

Inactive Publication Date: 2009-04-08
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This imposes limits on the speed and accuracy with which the system can move

Method used

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  • Control system, lithographic apparatus, device manufacturing method and device manufactured thereby
  • Control system, lithographic apparatus, device manufacturing method and device manufactured thereby
  • Control system, lithographic apparatus, device manufacturing method and device manufactured thereby

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0067] figure 1 A lithographic projection apparatus according to a specific embodiment of the present invention is schematically shown. The unit includes:

[0068] - a radiation system Ex, IL for providing a radiation projection beam PB (e.g. EUV radiation), in this specific case also a radiation source LA;

[0069] - a first target table (mask table) MT provided with a mask holder for holding a mask MA (e.g. a reticle) and with first positioning means for precisely positioning the mask relative to the object PL connect;

[0070] - a second target table (substrate table) WT provided with a substrate holder for holding a substrate W (e.g. a resist-coated silicon wafer) and with second positioning means for precise positioning of the substrate relative to the object PL connect;

[0071] - A projection system ("lens") PL (eg mirror set) for imaging the radiation portion of the mask MA onto a target portion C of the substrate W (eg comprising one or more dies).

[0072] As n...

Embodiment approach 2

[0103] A second embodiment of the invention is shown in FIG. 4 . Except for what is described below, the structure of this embodiment is the same as that of the first embodiment.

[0104] In this embodiment, the single-phase actuating means of the first embodiment is replaced by a multi-phase actuating means 11, for example a three-phase electric motor. Each phase of the actuating device 11 has Image 6 The corresponding control system shown in . Each control system is the first embodiment applied current commutator 3 and voltage commutator 7 . The current commutator 3 has a current setpoint I S The input and the position dependent commutation phase information (position dependent commutation phase information) φ. The voltage commutator 7 has a voltage feedforward U ff The input and position-dependent commutation phase information φ. The position-dependent commutation phase information φ represents the magnetic phase the coil is experiencing (which is position-dependent)...

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PUM

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Abstract

A control system for positioning means 10 comprising a PID type controller 4, or other connected in a feedback loop. The controller calculates a current for supply to the positioning means 10 according to the error between the desired value of current Is and the measured value of current Im. This current is converted to a voltage by amplifier 6 and further modified by a feedforward voltage Uff calculated using mechanical and electrical characteristics of the positioning means and desired position and / or desired derivatives of position.

Description

technical field [0001] The invention relates to a control system for a positioning device, comprising: [0002] - a setpoint generator for calculating the desired current or voltage supplied to the positioning means based on the desired position of the positioning means and / or its derivative; [0003] - a controller for outputting a signal to said positioning device according to said required current or voltage; and [0004] - at least one sensor for measuring the current value of the current or voltage; [0005] wherein the controller is connected in a feedback loop such that the controller has as its input the error between the desired current or voltage and the measured current or voltage. Background technique [0006] The term "patterning device" as used herein should be broadly interpreted as a device capable of imparting a patterned cross-section to an incident radiation beam, wherein said pattern corresponds to a pattern to be formed on a target portion of a substra...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027G05B11/36G05B19/19
CPCG05B2219/41436G03F7/70725G05B2219/41426G05B2219/41432G05B2219/45028G05B2219/37317G05B19/19B05B11/0005B05B11/1011B05B11/1042
Inventor J·A·A·T·达姆斯
Owner ASML NETHERLANDS BV
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