Vacuum insulation structure

A vacuum insulation and vacuum technology, applied in the direction of insulators, electrical components, circuits, etc., can solve the problems of poor radial insulation and poor longitudinal tensile strength, so as to increase the flashover voltage, increase the flashover field strength, and reduce the secondary The effect of the sub-electron emission coefficient

Inactive Publication Date: 2009-05-27
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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Problems solved by technology

[0006] In order to overcome the shortcomings of poor radial insulation and poor longitudinal tensile strength in the prior art, the present invention proposes a novel high-gradient electrical insulation structure, which uses insulating material film rings and metal film rings with low secondary electron emission coefficients. Combined composite membrane structure

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Embodiment Construction

[0022] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0023] Such as Figure 5 As shown, the insulating matrix material 1 is a round rod-shaped polyimide, polyamide, polycarbonate, nylon 6, nylon 1010 material, with a diameter of 60 mm to 500 mm and a height of 30 mm to 200 mm; the insulating material film layer 2 It is alumina ceramics, chromium oxide ceramics or diamond-like carbon, and the thickness H1 of the insulating film is 1 micron to 100 microns, evenly distributed on the side of the cylinder of the base material; the main metal film layer 3 is a gold film layer or a titanium film layer or a zinc film The transition metal film layer 4 is located between the main metal film layer 3 and the insulating film layer 2, and is a 0.1 micron-0.3 micron thick chromium film layer; the metal film layer thickness H2 is 0.5 micron-10 micron, and the width W2 is 5 micron- 50 microns, and the distance W...

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Abstract

The invention relates to a vacuum insulating structure, which especially relates to an insulating structure for impulse voltage effect in the field of vacuum impulse technique. It is characterized in that it arranges a complex film layer between the vacuum impulse voltage of the base insulating material (1) and the vacuum touched surface; the complex film layer is formed by a low second time electron sending factor insulating material film layer (2) and a mental film layer (3), wherein the insulating material film layer (2) is located on the surface of the base insulating material (1); the mental film layer (3) can be embedded into the base insulating material (1) or the insulating material film layer (2). It arranges a transient metal layer (4) between the base insulating material (1) and the insulating material film layer (2).

Description

technical field [0001] The invention belongs to a vacuum insulation structure, in particular to an insulation structure withstanding pulse voltage in the technical field of vacuum pulse power. Background technique [0002] At present, the power in pulsed power technology has reached several terawatts, and the pulse frequency has also reached thousands of hertz. The insulation properties of vacuum-insulated components in pulsed power systems limit the size of the insulation components, system performance and operation. The vacuum surface flashover field strength of materials is generally much smaller than the bulk breakdown field strength and vacuum breakdown field strength, and its vacuum surface flashover characteristics determine the vacuum insulation performance. In the linear acceleration cavity of Dielectric Wall Accelerator and large-scale flash imaging system, due to the requirements of compact structure, low lateral impedance and overall system cost, the vacuum surf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01B3/00H01B19/00
Inventor 袁伟群严萍潘洋
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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