Method for inhibiting secondary electron emission coefficient of dielectric material
A technology of secondary electron emission and dielectric materials, which is applied in the fields of material capacitance, analytical materials, and material resistance, and can solve problems such as complex process flow, poor applicability, and high cost of manpower and material resources
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[0035] In order to make the purpose and technical solution of the present invention clearer and easier to understand. The present invention will be further described in detail below in conjunction with the drawings and embodiments. The specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0036] In the description of the present invention, it should be understood that the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be A mechanical connection can also be an electrical connection; it can be a direct connection or an indirect connection through an intermediary, and it can be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.
[0037]...
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