Dishware cleaning and drying machine

Abstract

The present invention provides a cleaning and drying machine for tableware, which can mix adequacy outer gas into the exhaust in a cleaning groove, and reduces exhaust temperature, and spurs the exhaust reduce water, as well as improves exhaust comfort. The cleaning and drying machine for tableware comprises a vent (7) for discharging the humidity in the cleaning groove (1), a drying device (9) for drying a fan (6), and a control device (16) for controlling the drying device (9). The drying device is arranged with a mixing device (13) which locates upstream side of the vent and is used to mix the outer gas as well as the gas in the cleaning groove; and a wind quantity distributing device (12) for changing the mixing ratio of the outer gas and the gas in the cleaning groove. Thus, the flow ratio of the outer gas transfluxing the mixing device and the gas in the cleaning groove can set freely, reducing the humiture of exhaust, which not only prevents sirocco reliably, but improves drying performance.

Description

technical field [0001] The invention relates to a tableware washing and drying machine which is arranged in a kitchen or the like and is used for storing objects to be cleaned and automatically performing cleaning and drying operations. Background technique [0002] In the existing above-mentioned tableware washing and drying machine, when cleaning is completed and the object to be cleaned is dried, it is necessary to blast outside air into the cleaning tank and discharge the high-temperature and humid air in the cleaning tank (one example can be Refer to Japanese Patent Laid-Open Publication No. 2000-166847). [0003] FIG. 7 shows a conventional dish washer and dryer disclosed in the above reference. As shown in Figure 7, this tableware washing and drying machine is provided with: a washing tank 1 for storing objects to be washed, a washing nozzle 2 for spraying washing water, and a washing pump 3 for pressurizing the washing water. Cleaning device 4, the heating device 5...

AI Technical Summary

Problems solved by technology

[0004] However, the structure adopted in the above-mentioned conventional device is to rely on the suction force generated by the high-temperature and high-humidity main airflow flowing into the exhaust port to mix new external air into the exhaust gas as a secondary airflow.

Although this can reduce the exhaust temperature of the high-temperature and humid cleaning tank 1, there is a problem of insufficient external air volume, and the exhaust air flow cannot be sufficiently cooled to the extent that the hot air feeling can be avoided.

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