Apparatus and method for measuring optical system parameter

Abstract

A parameter measurement device of optical system comprises a short coherent light module, a focusing lens, a collimation lens, a filtering pinhole, a splitter, a corner reflector, an one-dimension accurate mobile station, an adjustable focus telescope, a micro swivel, a focusing lens and an imaging CCD. And a relative measurement method uses optical interferometry to accurately measure the eccentricity, inclination, lens thickness and lens distances of an object optical system. The invention can improve the eccentricity measurement accuracy of lens to match higher eccentricity demand, realize the final measurement of internal distances in optical system and realize the distance of assembled optical system.

Description

technical field [0001] The invention relates to a measuring device for measuring parameters of an optical system and a measuring method thereof, in particular to centering and spacing detection used in the assembling process of a lithography objective lens in lithography projection. Background technique [0002] In recent years, in the field of semiconductor lithography, the projection lithography technology has been continuously improved, and the lines have been advanced in a finer direction. At present, the critical size of the chip has reached the lithography resolution capability of 45nm. The imaging quality of the optical projection objective in the lithography system is a key factor affecting the resolution of the lithography. The centering of the lithography objective during the adjustment process and the thickness between different optical lenses will greatly affect the final optical quality of the objective. Quality, which requires sophisticated on-line measurement ...

AI Technical Summary

Problems solved by technology

This method sometimes requires contact measurements with optical surfaces, which cannot be measured after assembly

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